Degradation Assessment of SiC MOSFETs under the Repetitive Short Circuit Ageing with Different Gate-Source Voltage Bias

Yuan Li,Yuanfu Zhao,Alex Q. Huang,Liqi Zhang
DOI: https://doi.org/10.1109/compel49091.2020.9265821
2020-01-01
Abstract:A novel on-the-fly repetitive short circuit (RSC) ageing system under different gate-source voltage bias (V GS ) is designed. The static behaviors of SiC planar-gate MOSFET C2M0080120D and SiC trench-gate MOSFET SCT3080KL under the low and high V GS biases RSC ageing are quantitatively and experimentally compared for the first time. A bidirectional threshold voltage shift with different degradation rates in both types of devices is observed. The smaller change of SiC trench-gate MOSFET SCT3080KL is observed compared to SiC planar-gate MOSFET C2M0080120D under low and high V GS biases RSC ageing.
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