Analysis of Wavefront Aberration in a Single Collimating Lens Based Dual-Beam Exposure System

Vunam Le,Guanhao Wu,Lijiang Zeng

DOI: https://doi.org/10.1364/cleopr.2020.p4_12

2020-01-01

Abstract:We analyzed the interference wavefront aberration in a single collimating lens based dual-beam exposure system. A linear relationship between the aberration and pinholes’ position was obtained and a 0.03λ-aberration in 65mm×65mm area was achieved.

What problem does this paper attempt to address?

Interferometry Measurement Of Parallel Optical Plate Wavefront

Yang Yi,Ren Huan,Shi Zhendong,Liu Yong,Liu Xu,Yuan Quan,Yang Xiaoyu,Zhang Lin

DOI: https://doi.org/10.1117/12.2246099

2016-01-01

Abstract:In this paper, a method is introduced to test wavefront aberration of parallel optical plate wavefront, which based on Fourier transform. When testing the wavefront aberration of parallel optical plate, there is multiple-surface interference which phase-shifting interferometry cannot handle with. With the help of wavelength-modulation phase-shifting interferometry and Fourier transform, this method can isolate the multiple-surface interference fringes in frequency domain. This paper expound the principle of the method, and analyze the key parameter of the testing method: the suitable cavity/thickness ratio and sampling frame number. A simulation experiment is set up to verify the accuracy of this method, then the comparison test with traditional method shows that the relative deviation between the two methods is <= 5%.
Wavefront Analysis Method of Pinhole Point-Diffraction Based on Waveguide Theory

Chen Yuankai,Li Yao,Wang Chen,Bai Jian,Yang Yongying

DOI: https://doi.org/10.3788/aos201939.1112001

2019-01-01

Abstract:A wavefront analysis method of pinhole point-diffraction based on waveguide theory is proposed in this paper. In this method, the pinhole is treated as a circular waveguide and the modes in the waveguide arc calculated by analytical method to acquire the electric field distribution at the back surface of the pinhole. Next, diffraction wavefront in the far field is derived by the vector diffraction theory. Finally, the pinhole transmittance, the intensity and the phase of the diffraction wavefront arc analyzed in detail. Results show that the boundary conditions of the waveguide cause the rotation asymmetry of the electric field components at the back surface of the pinhole, and then introduce the astigmatism aberration into the diffraction wavefront. In order to make the transmittance larger than zero, the pinhole diameter must be greater than 0.6 lambda to ensure that the modes in the pinhole meet the waveguide transmission conditions. The difference of the amplitude distribution between two electric field components in diffraction wavefront leads to rotational asymmetry of the intensity of the diffraction wavefront, while the difference of the phase distribution makes the diffraction wavefront elliptically polarized. Simulation results obtained in this method provide vital reference for the design of the pinhole structure in the point-diffraction interferometer.
The wavefront aberration analysis and testing accuracy evaluation for the large aberration aspheric system based on the best fit sphere - art. no. 68342V

Junmiao Weng,Yongying Yang,Dong Liu,Yibing Shen,Yongmo Zhuo

2008-01-01

Abstract:fIn the measurement of aspheric surfaces, the vertex sphere and the best fit sphere are often used as reference sphere to calculate the non-null compensation deviation. In traditional interferometry, the detected wavefront is equal to twice of the deviation; but it is true only in the null condition or with a certain tolerance in the near null condition. In the non-null condition, when reference spherical wavefront (the best fit sphere in this paper) incidences to the aspheric surface, the rays will not return in the same path but deviate certain angles which cause normal longitudinal aberration. If the normal longitudinal aberration is small enough, for example, much smaller than one wavelength, the wavefront aberration can be equalized to twice of the deviation between the aspheric surface and the reference sphere. However, if the normal longitudinal aberration can not be negligible, the wavefront aberration should not be equalized to twice of the deviation. In this paper, the distribution of the deviation between the aspheric surface and the reference sphere is modeled, and the relationship between the wavefront aberration and the normal longitudinal aberration is discussed. Two paraboloids, one with small asphericity and the other large, are analyzed respectively to compare the different result when whether considering the influence of the normal longitudinal aberration. Computer simulation is also carried out in optical tracing software.
The Wavefront Aberration Analysis and Testing Accuracy Evaluation for the Large Aberration Aspheric System Based on the Best Fit Sphere

Junmiao Weng,Yongying Yang,Dong Liu,Yibing Shen,Yongmo Zhuo

DOI: https://doi.org/10.1117/12.756577

2007-01-01

Abstract:In the measurement of aspheric surfaces, the vertex sphere and the best fit sphere are often used as reference sphere to calculate the non-null compensation deviation. In traditional interferometry, the detected wavefront is equal to twice of the deviation; but it is true only in the null condition or with a certain tolerance in the near null condition. In the non-null condition, when reference spherical wavefront (the best fit sphere in this paper) incidences to the aspheric surface, the rays will not return in the same path but deviate certain angles which cause normal longitudinal aberration. If the normal longitudinal aberration is small enough, for example, much smaller than one wavelength, the wavefront aberration can be equalized to twice of the deviation between the aspheric surface and the reference sphere. However, if the normal longitudinal aberration can not be negligible, the wavefront aberration should not be equalized to twice of the deviation. In this paper, the distribution of the deviation between the aspheric surface and the reference sphere is modeled, and the relationship between the wavefront aberration and the normal longitudinal aberration is discussed. Two paraboloids, one with small asphericity and the other large, are analyzed respectively to compare the different result when whether considering the influence of the normal longitudinal aberration. Computer simulation is also carried out in optical tracing software.
A Single Collimating Lens Based Dual-Beam Exposure System for Fabricating Long-Period Grating

Vunam Le,Guanhao Wu,Lijiang Zeng

DOI: https://doi.org/10.1016/j.optcom.2019.125139

IF: 2.4

2020-01-01

Optics Communications

Abstract:A single collimating lens based dual-beam exposure system is proposed in this paper in which two interference beams share one collimating lens. Based on theoretical analysis and simulation, the interference aberration caused by the pinholes on the off-axis positions is compensated through feedback adjustment of the pinholes' relative position. This system is more compact and stable, and can avoid the spatial position interference between two collimating lenses in traditional dual-beam exposure systems for fabricating long-period gratings. A 5 mu m period grating exposure system is constructed to verify the theoretical analysis. Using the proposed adjustment method, a spacing error of approximately 0.03 lambda within the aperture of 65 mm x 65 mm is achieved.
A MEASUREMENT AND ANALYTICAL METHOD FOR THE EFFECTS OF OBJECTIVE LENS ABERRATION ON ITS RESOLUTION

Yibing Shen,Guoguang Yang

1999-01-01

Abstract:Resolution of an objective lens is not only affected by the applied wavelength, coherence degree of the light source and the numerical aperture ( NA ) of the objective lens, but also largely affected by the lens aberration. In this paper, a new method is presented to measure and analyze the overall effects of the lens aberration and manufacturing which will affect the lens resolution . The concept of ' virtual aberration, plate is first introduced in calculating the measured results . Two different lens were measured and calculated, and the exposure experiments on photoresist with these lens showed good agreements of the theoretical calculation and measured results.
Coma Optimization in Single Spherical Collimating Lens-Based Dual-Beam Exposure System

Vunam Le,Guanhao Wu,Lijiang Zeng

DOI: https://doi.org/10.1117/1.oe.59.9.094103

IF: 1.3

2020-01-01

Optical Engineering

Abstract:The single collimating lens-based dual-beam exposure system is a holographic exposure system that is suitable for fabricating long-period gratings. The interference wavefront aberration in this system requires optimization. We analyzed the coma of a single collimating lens-based dual-beam exposure system, and the linear relationships between the coma and the positions of the pinholes and substrate are obtained. Based on these relationships, we can eliminate the coma by adjusting the pinholes or substrate along the optical axis of the collimating lens. Consequently, the defocus aberration, astigmatism, low-order spherical aberration, and coma are all simultaneously optimized by adjusting the exposure system to meet the pinhole symmetry condition and coma optimization condition. Because the optimized interference wavefront aberration includes only high-order aberrations with low peak to valley values, a high-quality exposure wavefront can be obtained. Furthermore, a 5-mu m period grating exposure system is constructed with a spherical collimating lens of 0.6 lambda spherical aberration. Through the optimization process, a low spacing error of similar to 0.04 lambda within an aperture of 65 x 65 mm(2) is achieved (the theoretical value is 0.002 lambda). (C) 2020 Society of Photo-Optical Instrumentation Engineers (SPIE)
Study on testing larger asphericity in non-null interferometer - art. no. 68340T

Yongying Yang,Dong Liu,Yibing Shen,Junmiao Weng,Yongmo Zhuo

DOI: https://doi.org/10.1117/12.760144

2008-01-01

Abstract:Optical systems benefit from the use of aspheric surfaces because aspherics provide additional degrees of freedom for aberration control, yielding higher performance while reducing system weight and complexity. But optical designers always avoid to use aspheres with larger asphericity in optical systems mainly for the reason that the test of the steep aspherics requires extraordinary skill of the experimenter and the technical means to reduce the asphericity of the wavefronts that detected by the digital camera. Even though null optics can be adopted to compensate the asphericity of the test wavefront, they are not suitable for many cases. Each aspheric surface requires a unique null optics, which greatly increases a project's complexity, cost and time delay. In this paper, a type of novel lens with large longitude aberration and simple structure is proposed to reduce the asphericity of the wavefronts. The characteristic and the design process of the simple lens are discussed in detail. A comparison between the simple lens and the aplanat with different focus setting is given. Computer simulation shows the simple lens has much more power in reducing asphericity.
Design Beam Shapers with Double Freeform Surfaces to Form a Desired Wavefront with Prescribed Illumination Pattern by Solving a Monge-Ampère Type Equation

Shengqian Chang,Rengmao Wu,Li An,Zhenrong Zheng

DOI: https://doi.org/10.1088/2040-8978/18/12/125602

IF: 2.1

2016-01-01

Journal of Optics

Abstract:Beam shaping, in other words, the control of both intensity distribution and phase profile, has a wide range of applications. In this paper, double freeform surfaces are utilized to shape collimated beams, realizing an arbitrary output wavefront with desired illumination pattern. Freeform surfaces are designed by solving a second order partial differential equation (PDE) of the Monge-AmpSre (MA) type, without the limitation of symmetry or paraxial approximation. The mathematical derivation of the PDE is based on the Snell's law, the energy conservation law along infinitesimal tubes of rays and the constancy of the OPL. The PDE is discretized with a finite difference scheme into a system of nonlinear equations, which can be numerically solved by Newton's method. Since Newton's method requires a good initialization for the iteration, a simultaneously point-by-point method, based on ray mapping, is employed to find the initial iterate. Different design examples are given to demonstrate the effectiveness and wide application of our method, transforming a collimated Gaussian beam into a spherical wavefront with uniform illumination patterns. Variable-sized uniform illumination pattern can be obtained by moving the observation plane due to a potential benefit of the spherical output wavefront.
Spherical Aberration Compensation Method for Long Focal-Length Measurement Based on Talbot Interferometry

Yupeng Luo,Xiao Huang,Jian Bai,Juan Du,Qun Liu,Yujie Luo,Jia Luo

DOI: https://doi.org/10.1117/12.2269604

2017-01-01

Abstract:Large-aperture and long focal-length lens is widely used in high energy laser system. The method based on Talbot interferometry is a reliable method to measure the focal length of such elements. By employing divergent beam and two gratings of different periods, this method could realize full-aperture measurement, higher accuracy and better repeatability. However, it does not take into account the spherical aberration of the measured lens resulting in the moire fringes bending, which will introduce measurement error. Furthermore, in long-focal measurement with divergent beam, this error is an important factor affecting the measurement accuracy. In this paper, we propose a new spherical aberration compensation method, which could significantly reduce the measurement error. Characterized by central-symmetric scanning window, the proposed method is based on the relationship between spherical aberration and the lens aperture. Angle data of moire fringes in each scanning window is retrieved by Fourier analysis and statistically fitted to estimate a globally optimum value for spherical-aberration-free focal length calculation. Simulation and experiment have been carried out. Compared to the previous work, the proposed method is able to reduce the relative measurement error by 50%. The effect of scanning window size and shift step length on the results is also discussed.
Aberration Analysis and Adjustment of Non-Spherical Lens in the Linear Ccds Three-Dimensional Measurement System

J Wu,HS Ding,GZ Wang

DOI: https://doi.org/10.1117/12.508461

2004-01-01

Abstract:Linear CCDs three-dimensional measurement system is constituted with three one dimensional imaging units (ODIUs) composed of charge-couple device (CCD) linear image sensor paired with equivalent cylindrical lens cells. The cylindrical lens is needed for optical transformation from object point to its realistic image line in the ODIU, and the imaging quality of equivalent cylindrical lens (width and distortion aberration of the image line) directly affected the reconstruction precision of three dimension coordinates. At present, the methods of how to design an equivalent cylindrical lens with both high precision and wide field of view were not reported in literatures. An improved Double Gauss structured lenses by replacing the first spherical lens in the traditional Double Gauss lenses with a cylindrical lens is introduced to realize the point to line optical transformation and aberration adjustment. The coma aberration and distortion can be automatically adjusted due to the structure symmetry of composite lenses, and the spherical aberration, astigmatism and curvature of field can also be largely adjusted by appropriately selecting material, luminous flux, curvature, thickness, and distance of lenses. Under the computer simulating by Zemax (an optical systems design software), the composite cylindrical lens was designed and fabricated. Finally, the three-dimensional positioning system made up of above-mentioned composite cylindrical lens and corresponding circuits is constructed, and the direct linear transformation (DLT) is adopted to three dimension coordinated reconstruction. The result of reconstruction error of X, Y, Z axis with in the view field of 700*760*500 mm. less than 1mm are obtained.
Analysis Of Nonlinear Self-Focusing Phenomenon In High-Power Laser System Based On Ray-Tracing

weiwei wang,xiaotong li,zhaofeng cen,luwei zhang

DOI: https://doi.org/10.1117/12.2071845

2014-01-01

Abstract:In high power laser systems, nonlinear effect, one of the key factors of beam wavefront aberration and even irreversible damage to system, has always been one of the top considerations of researchers for decades. A hybrid ray-tracing method for both linear media and nonlinear media based on geometric optics is presented in this paper and realized by programming. In a simple optic system with KDP crystal, an obvious decline of beam quality is observed in high laser power density conditions and a method taking component intervals as compensation of beam quality is proved feasible. Considering the complexity of traditional modeling method based on surfaces, a modeling method based on components is established. Hopefully, the conclusions and flaws of this paper can shed light on relevant work and further research.
Description and implementation studies on field dependent wavefront aberration

Luwei Zhang,Xiaotong Li,Zhaofeng Cen

DOI: https://doi.org/10.1117/12.999684

2012-01-01

Abstract:Zernike polynomials have been widely used to fit lens surface figure error and the wavefront aberration of optical systems, for its orthogonality in the unit circle and its corresponding relationships with optical aberrations 1. Because the current extensively used Zernike polynomials are just functions of the aperture, without consideration of the field factor, it can only represent single field wavefront aberration. This is incomplete for the description of the wavefront aberration, especially for lithographic lens with a large field and high imaging quality 2. Thus, considering the field factor in the description of wavefront aberration becomes very necessary. This paper presents a convenient and practical method to describe the full field wavefront aberration. A rotationally symmetric optical system has been taken as an example, in the scope of normalized full field, taking the Chebyshev zero points as nodes, and applying the Chebyshev polynomials to the fitting of Zernike coefficients of different fields. Meanwhile, the influence of the degree of Chebyshev polynomials and the number of fitting nodes on the fitting accuracy is taken into account. The results show that the fitting method used in this paper is of high accuracy, and this fitting method is very significant for the analysis of full field wavefront aberration.
Doublet liquid variable-focus lens for spherical aberration correction

Jia-Wei Du,Xuan-Yin Wang,Shi-Qiang Zhu,Dan Liang

DOI: https://doi.org/10.1016/j.ijleo.2016.11.170

IF: 3.1

2017-01-01

Optik

Abstract:A novel doublet liquid variable-focus lens with simple structure was designed and fabricated for spherical aberration correction under the condition of small focal length, which was 11.8 mm to 25 mm. By changing the shape of the two PDMS membranes respectively, the focal length of the proposed lens was changed and the spherical aberration was corrected. The size of the entire lens was very small and overall structure of the proposed lens was presented, as well as the design process. The ZEMAX software was used to optimize the optical parameters of the proposed lens. The deformation of the PDMS membranes was measured and fitted by spherical curve. The longitudinal spherical aberration was measured in experiments and compared with the optimal design results. In order to weaken the gravity effect, we designed the shape of the rear PDMS membrane and presented the detailed description of the fabrication process. (C) 2016 Elsevier GmbH. All rights reserved.
Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference

Lu Sen,Yang Kaiming,Zhu Yu,Wang Leijie,Zhang Ming

DOI: https://doi.org/10.3788/aos201838.0605001

2018-01-01

Abstract:Extremely straight interference fringes can be formed at the position far away from the waist of Gaussian beams and based on this principle, a novel far-field-interference-based scanning beam interference lithography (SB1L) optical system is proposed. The analytic expression of the nonlinear error with respect to waist radius of Gaussian beams, the incident angle and the waist-to-substrate distance is established. By the numerical simulation, the relationships between the nonlinear error of fringes and the above parameters arc analyzed in detail. The research results show that this optical system can effectively limit the nonlinear error of fringe phase to the nanometer scale, and possesses the advantages of simple optical path and high tolerance of assembly errors. The problem that the nonlinear error of fringes at the boundary of the exposure spot is deteriorated can be effectively solved if the waist-to-substrate distance is suitably shortened.
Wavefront-aberration Measurement and Systematic-Error Analysis of a High Numerical-Aperture Objective

Zhixiang Liu,Tingwen Xing,Yadong Jiang,Baobin Lv

DOI: https://doi.org/10.1117/1.oe.57.2.024107

IF: 1.3

2018-01-01

Optical Engineering

Abstract:A two-dimensional (2-D) shearing interferometer based on an amplitude chessboard grating was designed to measure the wavefront aberration of a high numerical-aperture (NA) objective. Chessboard gratings offer better diffraction efficiencies and fewer disturbing diffraction orders than traditional cross gratings. The wavefront aberration of the tested objective was retrieved from the shearing interferogram using the Fourier transform and differential Zernike polynomial-fitting methods. Grating manufacturing errors, including the duty-cycle and pattern-deviation errors, were analyzed with the Fourier transform method. Then, according to the relation between the spherical pupil and planar detector coordinates, the influence of the distortion of the pupil coordinates was simulated. Finally, the systematic error attributable to grating alignment errors was deduced through the geometrical ray-tracing method. Experimental results indicate that the measuring repeatability (3 sigma) of the wavefront aberration of an objective with NA 0.4 was 3.4 m lambda. The systematic-error results were consistent with previous analyses. Thus, the correct wavefront aberration can be obtained after calibration. (c) 2018 Society of Photo-Optical Instrumentation Engineers (SPIE)
Beam collimation of laser diode based on double-focus micro-lens

Ming-xing LIAO,Xiang WANG,Wei-ming JIAN

DOI: https://doi.org/10.3969/j.issn.1001-5078.2016.03.010

2016-01-01

Abstract:Aiming at beam collimation of laser diode,a method that can collimate the LD beam with single double-fo-cus micro-lens is proposed based on the analysis of astigmatism.Theoretical analysis and ZEMAX simulation show that micro-lens with biconic surface can collimate fast and slow axes of the beam at the same time.The elliptical mi-cro-lens with double-focus was manufactured by melting photoresist.Then the experiment of LD beam collimation was carried out,and the beam divergence angles before and after collimation were measured.The results show that double-focus micro-lens can collimate effectively.
Analysis of the Effects on Ultra-Short Laser Pulse Beam Quality Caused by Errors in Optical Systems

Shang Hong-bo,Cen Zhao-feng,Li Xiao-tong,Liu Qiang-sheng,Hu Wei

DOI: https://doi.org/10.1117/12.866868

2010-01-01

Abstract:The quality of the ultra-short laser pulse need to be controlled in applications. In this paper, the effects on ultra-short laser pulse beam quality caused by surface errors and assembly errors in real optical systems is analyzed in a microscope objective system. Zernike polynomials are used to describe the surface errors and error limit is set for the tilt and decenter in assembly. When coming to calculations, we firstly take samples from the incident laser pulse and decompose it into different frequency components; then we use ray-tracing combing with diffraction integral from the exit pupil to the focal plane for calculation. According to the result of the calculation and analysis, we can reasonably control the surface errors and assembly errors in the microscope object system.
Fabrication of Gratings with Low Spacing Error by the Dual-Beam Exposure System with Spherical Lens

Shiwei Wang,Lijiang Zeng

DOI: https://doi.org/10.1364/cleo_at.2015.jth2a.104

2015-01-01

Abstract:We propose a feedback method of adjusting the dual-beam exposure system with spherical collimation lenses based on deducing the spacing error from diffraction wavefront. The grating of 0.03 λ in 70×70 mm 2 can be achieved.
Ray Aberrations Analysis for Phase Plates Illuminated by Off-Axis Collimated Beams.

Wenzi Zhang,Zi Ye,Yanping Chen,Tingyu Zhao,Feihong Yu

DOI: https://doi.org/10.1364/oe.15.003031

IF: 3.8

2007-01-01

Optics Express

Abstract:Approximate expressions of the ray aberrations for off-axis collimated beams and free form phase plates with a small derivative magnitude are derived with the defocus aberration taken into account. The cubic phase plate, which is one of the most commonly used phase plates in wavefront coding imaging systems, is illustrated as an example. The approximate expressions for the upper and lower boundaries of ray map, and the spot size in the vicinity of the focal plane are derived. The sensitivity to the defocus aberration and the variation of the induced aberrations with respect to the field positions are analyzed with derived approximate expressions as well. Some characteristics unmentioned before are derived, showing a good agreement with the exact aberrations. Finally some useful guidelines are given for the design of imaging systems with phase plates.

Analysis of Wavefront Aberration in a Single Collimating Lens Based Dual-Beam Exposure System

Interferometry Measurement Of Parallel Optical Plate Wavefront

Wavefront Analysis Method of Pinhole Point-Diffraction Based on Waveguide Theory

The wavefront aberration analysis and testing accuracy evaluation for the large aberration aspheric system based on the best fit sphere - art. no. 68342V

The Wavefront Aberration Analysis and Testing Accuracy Evaluation for the Large Aberration Aspheric System Based on the Best Fit Sphere

A Single Collimating Lens Based Dual-Beam Exposure System for Fabricating Long-Period Grating

A MEASUREMENT AND ANALYTICAL METHOD FOR THE EFFECTS OF OBJECTIVE LENS ABERRATION ON ITS RESOLUTION

Coma Optimization in Single Spherical Collimating Lens-Based Dual-Beam Exposure System

Study on testing larger asphericity in non-null interferometer - art. no. 68340T

Design Beam Shapers with Double Freeform Surfaces to Form a Desired Wavefront with Prescribed Illumination Pattern by Solving a Monge-Ampère Type Equation

Spherical Aberration Compensation Method for Long Focal-Length Measurement Based on Talbot Interferometry

Aberration Analysis and Adjustment of Non-Spherical Lens in the Linear Ccds Three-Dimensional Measurement System

Analysis Of Nonlinear Self-Focusing Phenomenon In High-Power Laser System Based On Ray-Tracing

Description and implementation studies on field dependent wavefront aberration

Doublet liquid variable-focus lens for spherical aberration correction

Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference

Wavefront-aberration Measurement and Systematic-Error Analysis of a High Numerical-Aperture Objective

Beam collimation of laser diode based on double-focus micro-lens

Analysis of the Effects on Ultra-Short Laser Pulse Beam Quality Caused by Errors in Optical Systems

Fabrication of Gratings with Low Spacing Error by the Dual-Beam Exposure System with Spherical Lens

Ray Aberrations Analysis for Phase Plates Illuminated by Off-Axis Collimated Beams.