Research on the Large Field Projection Lithograph Lens

GAO Bo,ZHUANG Hua-jie,MA Tao,SHEN Yi-bing

DOI: https://doi.org/10.3969/j.issn.1005-5630.2005.05.013

2005-01-01

Abstract:The large field projection lithography lens is a special optical lenses form,which put an high demands on the design and processing both for mechanical and optical.In this presentation,based on the lithography lenses which can be used to exposure an 8 inch wafer by one step, we analyzed the various factors which may cause the image quality deterioration of the optical system especially for this type of lenses,by ZEMAX simulation we set the tolerance both for optical parts and mechanical parts,also the procedures of the adjustment and assembly for the whole lenses are described.By testing the resolution and distortion of this lenses,we found that the completed projection lenses reach the design specification.