1.03pW/b Ultra-Low Leakage Voltage-Stacked SRAM for Intelligent Edge Processors

Jingcheng Wang,Hyochan An,Qirui Zhang,Hun Seok Kim,David Blaauw,Dennis Sylvester
DOI: https://doi.org/10.1109/VLSICircuits18222.2020.9162843
2020-01-01
Abstract:A stacked voltage domain SRAM is proposed where arrays are split into two sets (top and bottom) with their supplies connected in series. System supply current is reused by top and bottom sets, and supply voltage is divided among the two sets of arrays, enabling seamless integration of very low voltage SRAM retention in a larger system with a nominal supply, without need for an efficiency-reducing LDO. An array swapping approach provides stable access to arbitrary banks within one system clock cycle. A comprehensive sizing strategy (W&L) is employed to optimally balance hold stability and bitcell size. Integrated in an IoT imaging system in 40nm CMOS, the proposed 8.9Mb SRAM achieves 1.03pW/bit leakage, a >100× reduction over conventional SRAM in the same technology.
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