Microstructures of Nickel-Doped Methylated Silica Membrane Materials Calcined in Air: Influence of Ni Content

Jing Yang,Xiaoting Xing,Yamei Zhao,Ruihua Mu,Yani Guo,Haiyun Hou
DOI: https://doi.org/10.1080/00150193.2020.1760596
2020-01-01
Ferroelectrics
Abstract:Nickel-doped methylated silica membrane materials (Ni/CH3-SiO2) were prepared with tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) as silicon precursors, and Ni(NO3)(2)center dot 6H(2)O as Ni source by sol-gel method. The effects of Ni content on the microstructures of Ni/CH3-SiO(2)membrane materials were investigated by means of X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM) and N(2)adsorption-desorption measurements. The results indicate that the Ni element is present in the form of Ni(NO3)(2)center dot 6H(2)O in the gel material. After firing at 350 degrees C in air, the Ni element mainly exists in the form of Ni-O-Si skeleton and nano-crystalline NiO. As the Ni content increased, the dispersity of NiO particles reduced and the grain size increased gradually. The methyl group is present in the Si-CH(3)form in the SiO(2)network. After the loading of Ni, the total pore volume decreased while the average pore size increased. The prepared 0.1Ni/CH3-SiO(2)membrane material exhibited excellent microporous structure and narrow pore size distribution with the average pore size of 1.94 nm. Its microporosity reached 79.9%, which increased by 17.9% compared with the CH3-SiO(2)material without Ni-loading.
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