Development of Hybrid Measuring System for the Complex Micro-Arrayed Surface

Tong Guo,Zhenshan Sun,Jinping Chen,Xing Fu,Xiaotang Hu
DOI: https://doi.org/10.1117/12.2509357
2019-01-01
Abstract:As the ultra-precision machining technology is developing in various directions and evolving into a higher level, the micro-nano measurement technology is also developing constantly. According to the different manufacturing processes and texture of measurement objects, the requirements of micro-nano measurement technology vary a lot. Optical Microscopy (OM), Scanning Probe Microscopy (SPM) or Scanning Electron Microscopy (SEM) cannot meet requirements of high efficiency, high resolution and three-dimensional morphology characteristics obtaining at the same time. Hence a hybrid measuring system including the Atomic Force Microscopy (AFM) and vertical scanning white-light interferometry is built. The measurement function of the dual feedback AFM system was verified by scanning a one-dimensional grid and the measurement function of white light vertical scanning interferometer was verified by measuring the step structure and comparing it with a three-dimensional optical profiler. And then the micro-arrayed structure is measured by white light vertical scanning interferometry. The vertices of the micro-arrayed unit structure is scanned by using AFM in the same coordinate system to verify the complex measurement function of the system on the complex micro-arrayed surface.
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