Gas-Phase Reactions Between Silane and Ammonia: A Theoretical Study
SW Hu,Y Wang,XY Wang,TW Chu,XQ Liu
DOI: https://doi.org/10.1021/jp035684m
2003-01-01
The Journal of Physical Chemistry A
Abstract:Gas-phase reactions between silane (SiH4) and ammonia (NH3) were investigated using ab initio calculations at the CCSD(T)/6-311++g**//MP2/6-31+G* level. Within the energy range of 180 kcal/mol, we located 34 equilibrium and 23 transition states on the potential energy surfaces of the Si-N-H systems. The initially weakly bonded molecular complex H3N-SiH4 eliminates the first hydrogen molecule (H-2) to form the Si-N bond three ways. The first route is through a dihydrogen-bonded transition state, over a barrier of 49.31 kcal/mol, leading directly to the most stable product silylamine (H2N-SiH3). The second route is through SiH4 dissociating into SiH2 and H-2, over a barrier of 57.47 kcal/mol, leading to the dative-bonded silylammonia complex H3N-SiH2. The third route is through a stepwise atomic dissociation and radical formation process, over a barrier of 131.21 kcal/mol, also leading to H3N-SiH2. With more energy, both H2N-SiH3 and H3NSiH2 are liable to further H2 or H elimination, leading to smaller species including molecules H2N-SiH, HN-SiH2, H3N-Si, HNSi, and HSiN and radicals H2N-SiH2, H3N-SiH, H2N-Si, and NSi. Dihydrogenbonded structures are also responsible for lowering barriers in these processes.