The Adsorption And Dissociation Of Ammonia On The Si-10 Cluster Surface

PeiLin Cao
DOI: https://doi.org/10.1088/0953-8984/9/31/008
1997-01-01
Abstract:The nature of NH3 molecule adsorption and dissociation on the Si-10 cluster surface has been studied by the DV-X-alpha method. Two isomers of Si-10 are considered. The calculated results show that there are different bond characters between T-d Si-10 and C-3v Si-10. We also present possible dissociation paths and their energy barriers for the adsorbed NH3 molecule, and confirm the view that NH3 cannot dissociate on either T-d Si-10 or C-3v Si-10 surfaces.
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