Abstract:Highlights • The active CeO 2 abrasives were prepared by reducing atmosphere assisted molten salt method. • The reducing atmosphere has a significant effect on the morphology of the CeO 2 abrasives. • The defect concentration on the surface of the CeO 2 abrasives increases with the enhancement of reducing atmosphere. • The enhanced polishing efficiency was attributed to the favorable changes in the morphology and Ce 3+ concentration of the CeO 2 abrasives. Ce 3+ as the active site on the CeO 2 abrasive surface is the key to enhancing the material removal rate (MRR). The CeO 2 abrasives with high chemical activity were prepared by the molten salt method under a reducing atmosphere. The crystal structure and morphology of CeO 2 abrasives were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), Fourier transform infrared spectroscopy (FT-IR), ultraviolet–visible diffuse reflectance spectroscopy (UV–Vis DRS), and X-ray photoelectron spectroscopy (XPS). The CeO 2 abrasives were obtained under different atmospheres (Air, Ar, and Ar/H 2 ). With the enhancement of the reducing atmosphere, the morphology of the abrasives transforms from spherical to octahedral, while more oxygen vacancies and Ce 3+ are generated on the surface of CeO 2 abrasives. The CMP experiments show that the MRR s of the CeO 2 -Air, CeO 2 -Ar, and CeO 2 -Ar/H 2 abrasives on SiO 2 substrates are 337.60, 578.74, and 691.28 nm/min, respectively. Moreover, as confirmed by atomic force microscopy (AFM), the substrate surfaces exhibit low roughness (∼0.5 nm) after being polished using all of the prepared samples. Especially, the MRR of CeO 2 -Ar/H 2 abrasives is increased by 104.76% compared with CeO 2 -Air abrasives. The improved CMP performance is attributed to the increased Ce 3+ concentration and the octahedral morphology of the abrasives enhancing the chemical reaction and mechanical removal at the abrasive–substrate interface. Graphical abstract Abrasives prepared under reducing atmosphere enhance polishing efficiency by affecting Ce 3+ concentration on the surface and morphology of the abrasive. Download : Download high-res image (251KB) Download : Download full-size image

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