Abstract:ZnO thin films were deposited on a glass substrate by dc (direct current) and rf (radio frequency) magnetron sputtering. Post-deposition annealing was performed in different atmospheres and at different temperatures. The correlation of the annealing conditions with the microstructure and properties of the ZnO films wer e investigated by ultraviolet-visible spectroscopy, X-ray diffraction, conductiv ity measurement and scanning electron microscopy. Only the strong 002 peak could be observed by X-ray diffraction. The post-deposition annealing of ZnO films wa s found to alter the film's microstructure and properties, including crystallini ty, porosity, grain size, internal stress level and resistivity. It was also fou nd that after annealing, the conductivity of poorly conductive samples often imp roved. However, annealing does not improve the conductivity of samples with high conductivity prior to annealing. The resistivity of as-grown films can be decre ased from 102 to 10-4Ω·cm after annealing in nitrogen. To explain the effects of annealing on the conductivity of ZnO, it is believed that annealing may alter the presence and distribution of oxygen defects, reduce the lattice stress, cau se diffusion, grain coarsening and recrystallization. Annealing will reduce the density of grain boundaries in less dense films, which may decrease the resistiv ity of the films. On the other hand, annealing may also increase the porosity of thin films, leading to an increase in resistivity.

Effect of Annealing Treatment on Optical and Electrical Properties of Zno Films

Enhanced Visible Light Response of ZnO Porous Thin Film by Post-Annealing Treatment

Effect of Annealing Temperature and CuO on Microstructure and Optical Band Gap of CuxZn1−xO Thin Films

Effect of Post-Thermal Annealing on Properties of Zno Thin Film Grown on C-Al(2)O(3)By Metal-Organic Chemical Vapor Deposition

In Situ and Ex Situ Investigation on the Annealing Performance of the Zno Film Grown by Ion Beam Deposition

Annealing Effects on the Microstructure and Photoluminescence Properties of Ni-Doped Zno Films

Annealing effect on mechanical properties of RF magnetron sputtering ZnO thin film

Influence of Annealing Atmosphere on Microstructure and Optical Properties of ZnO Thin Films

Thermal annealing effect on optical properties of electrodeposited ZnO thin films

Annealing Effect on Properties of Zno Thin Films Grown on LiNbO3 Substrates by MOCVD

Annealing effect on optical properties of ZnO films fabricated by cathodic electrodeposition

Air Annealing Effect on Oxygen Vacancy Defects in Al-doped ZnO Films Grown by High-Speed Atmospheric Atomic Layer Deposition

Effect of Annealing Temperature on the Electrical Properties of ZnO Thin-Film Transistors

Effect of annealing on optical properties of Mg(x)Zn(1-x)Othin films deposited at low temperature

Suppression of Oxygen Vacancy Defects in sALD-ZnO Films Annealed in Different Conditions

MICROSTRUCTURE AND PROPERTIES OF ANNEALED ZnO THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING

Effect of Annealing on Conductivity Behavior of Undoped Zinc Oxide Prepared by Rf Magnetron Sputtering

Influences of Annealing on the Opto-electronic Properties of ZnO Films Grown by Plasma-Enhanced MOCVD

Effects of Growth Temperature and Annealing on Properties of Zn3sn2o7 Thin Films and Application in Tfts

Influence of Annealing on Microstructure and Photoluminescence Properties of Al-Doped ZnO Films

Effect of Annealing Temperature on the Optical and Electrical Properties of N Doped MgZnO Films