Analyzing the Causes of Limited Performance Improvement in Cigs Devices after Potassium Fluoride Post-Deposition Treatment Using SCAPS

Shiqing Cheng,Boyan Li,Wei Liu,Kaizhi Zhang,Yunxiang Zhang,Zhichao He,Lie Lin,Shulong Sun,Yun Sun
DOI: https://doi.org/10.1016/j.ijleo.2020.164757
IF: 3.1
2020-01-01
Optik
Abstract:Recently, potassium fluoride post-deposition treatment (KF-PDT) attracts more attention for which has beneficial effect on open circuit voltage (Voc) with the CIGS solar cell conversion efficiency increased from 20.3 % to 22.9 %. However, the short circuit current density (Jsc) and fill factor (FF) are not always increased after KF-PDT. In this study, we investigate the absorber characteristics after KF-PDT and analyze the major factors which limit the improvement of Jsc and FF with SCAPS simulation. According to the simulation results, we find that the declining of Jsc and FF are due to the high electronic barrier formed at the interface of absorbe(1) (KInSe2)/absorber(2) after KF-PDT. However, the high electronic barrier can be lowered by increasing of Zn-Cu, or Cd-Cu concentration near absorber surface and by reducing the defects concentration on the buffer/absorber interface, thereby the improvement of Jsc and FF. In addition, the device performance of conduction band offset Delta AB >= 0 eV at buffer/absorber interface is enhanced obviously after potassium post treatment. Therefore, increasing the Zn-Cu, or Cd-Cu concentration and maintaining the Delta AB >= 0 eV are key points to further improve the device performance after KF-PDT.
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