Abstract:The prospect of employing nanophotonic methods for controlling photon–electron interactions has ignited substantial interest within the particle accelerator community. Silicon-based integrated dielectric laser acceleration (DLA) has emerged as a viable option by leveraging localized photonic effects to emit, accelerate, and measure electron bunches using exclusively light. Here, using highly regular nanopatterning over large areas while preserving the crystalline structure of silicon is imperative to enhance the efficiency and yield of photon-electron effects. While several established fabrication techniques may be used to produce the required silicon nanostructures, alternative techniques are beneficial to enhance scalability, simplicity and cost-efficiency. In this study, we demonstrate the nano-synthesis of silicon structures over arbitrarily large areas utilizing exclusively deep ultraviolet (DUV) ultrafast laser excitation. This approach delivers highly concentrated electromagnetic energy to the material, thus producing nanostructures with features well beyond the diffraction limit. At the core of our demonstration is the production of silicon laser-induced surface structures with an exceptionally high aspect-ratio -reaching a height of more than 100 nm- for a nanostructure periodicity of 250 nm. This result is attained by exploiting a positive feedback effect on the locally enhanced laser electric field as the surface morphology dynamically emerges, in combination with the material properties at DUV wavelengths. We also observe strong nanopattern hybridization yielding intricate 2D structural features as the onset of amorphization takes place at high laser pulse fluence. This technique offers a simple, yet efficient and attractive approach to produce highly uniform and high aspect ratio silicon nanostructures in the 200–300 nm range.

Realization of ∼10 Nm Features on Semiconductor Surfaces Via Femtosecond Laser Direct Patterning in Far Field and in Ambient Air

Microfabrication Assisted by Laser-Trapped Microparticle Tools

Femtosecond laser-induced dewetting of sub-10-nm nanostructures on silicon in ambient air

Realising high aspect ratio 10 nm feature size in laser materials processing in air at 800 nm wavelength in the far-field by creating a high purity longitudinal light field at focus

Microsphere femtosecond laser sub-50 nm structuring in far field via non-linear absorption

Optical FIB: Far-field Fabrication with Real-Nanoscale Spatial Resolution in Any Solid Materials

Surface Nano-fabrication by Laser Precision Engineering

Controllable fabrication of Sub-20nm structures with coupling field tip enhancement effect induced by nanosecond pulsed laser irradiation

Laser nano-fabrication inside silicon with spatial beam modulation and non-local seeding

Femtosecond Laser Precision Engineering: From Micron, Submicron, to Nanoscale

Laser nanofabrication inside silicon with spatial beam modulation and anisotropic seeding

Nanopatterning Of Silicon Via The Near-Field Enhancement Effect Upon Double-Pulse Femtosecond Laser Exposure

Direct And Subdiffraction-Limit Laser Nanofabrication In Silicon

Fast Fabrication of Large-Area Two-Dimensional Micro/Nanostructure by Femtosecond Laser

Nano-Structures Fabrication by Laser Combined with Near-Field Scanning Optical Microscopy

Nanoscale reshaping of resonant dielectric microstructures by light-driven explosions

Highly uniform silicon nanopatterning with deep-ultraviolet femtosecond pulses

Manufacturing of Functional Polymer Micro- and Nano-Structures by Femtosecond Laser Pulse

Remote and Rapid Micromachining of Broadband Low-Reflectivity Black Silicon Surfaces by Femtosecond Laser Filaments.

Surface Nanostructuring by Nano-/Femtosecond Laser-Assisted Scanning Force Microscopy

Direct Writing Nanostructures on Au Nano-Film by Laser Irradiating Cantilevered Scanning Near-Field Optical Microscope Tip