Synthesis of large-area uniform Si<sub>2</sub>Te<sub>3</sub>thin films for p-type electronic devices

Xuefen Song,Yuxuan Ke,Xiaosong Chen,Jidong Liu,Qiaoyan Hao,Dacheng Wei,Wenjing Zhang
DOI: https://doi.org/10.1039/d0nr01730b
IF: 6.7
2020-01-01
Nanoscale
Abstract:Two-dimensional (2D) p-n junctions are basic components of various functional devices. However, the shortage of natural p-type 2D semiconductors makes it difficult to achieve both p-type and n-type transport in high-performance multifunctional devices. Here, continuous and uniform p-type Si(2)Te(3)thin films are grown on SiO2/Si substrates, which are simultaneously used as anin situSi source. Large-size 2D films with dimensions of similar to 8 x 2 cm(2)are prepared for the first time using a reliable and simple chemical vapor deposition (CVD) technique. Film growth occursviathe vapor-liquid-solid mechanism, allowing the film thickness to be controlled by the substrate temperature. As the Si(2)Te(3)film thickness increases from 3 to 8 nm, the bandgap decreases from 2.07 to 1.65 eV. Moreover, the directly grown thin films possess high crystallinity, showing electronic properties that are comparable to those of MoTe(2)crystals and MoS(2)films. Therefore, this large-area growth of p-type Si(2)Te(3)enriches the 2D semiconductor library and opens up a new platform for the study of p-type Si2Te3, which has potential for application in p-n junctions.
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