Photoelectric Characteristic Evaluation of Different Structured UTBB MOSFETs

Liqiao Liu,Wangyong Chen,Xiaoyan Liu,Gang Du
DOI: https://doi.org/10.1109/ted.2020.2977963
IF: 3.1
2020-01-01
IEEE Transactions on Electron Devices
Abstract:This article presents an evaluation of the photoelectric characteristic of different structured ultrathin body and buried oxide (UTBB) MOSFETs. The UTBB MOSFETs can achieve photoelectric conversion by integrating a doped well or photodiode beneath the BOX. With lightly doped well, the well-UTBB (W-UTBB) image sensor is more sensitive to illumination. On the other hand, the photodiode-UTBB (PD-UTBB) image sensor has a larger full well capacity. The influence of well doped concentration and interface traps at BOX/well on the photoelectric characteristics of both devices has been investigated. The well doped concentration has great impacts on the light sensitivity of the W-UTBB. The interface traps would increase the dark current of the W-UTBB and reduce the internal quantum efficiency (IQE) of the PD-UTBB.
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