Boosting Solar Blind UV Detector by Constructing Enhanced-Mode MOS Field-Effect Transistors based on β-Ga 2 O 3 Film

Xue-Qiang Ji,Chao Lu,Jin-Jin Wang,Meng-Cheng Li,Xiao-Hui Qi,Jian-Ying Yue,Lei Shu,Pei-Gang Li
DOI: https://doi.org/10.1109/jsen.2023.3305772
IF: 4.3
2023-01-01
IEEE Sensors Journal
Abstract:A three-terminal metal–oxide field-effect transistor (MOSFET) switching device is an exciting solution for achieving low dark currents and high photocurrents. The back-gated structure effectively ensures the full exposure of the top layer of $\beta $ -Ga2O3 to incident light, thereby maximizing the collection of detection information. In this study, we achieved an enhanced mode back-gated MOSFET based on $\beta $ -Ga2O3 film for solar-blind UV detection applications with a film thickness of 80 nm. Compared to the traditional two-terminal structure, the MOS device’s channel was fully depleted via gate modulation, resulting in a further reduction of the intrinsic dark current. Meanwhile, the photoconductivity performance is greatly improved through the dual regulation mode of light intensity and gate voltage. As a consequence, the back-gated MOS photodetector (PD) shows a much superior photoelectric performance, characterized by an ultralow dark current of 0.018 pA and a high photo-to-dark current ratio (PDCR) of $6.7\times104$ . Our findings suggest that utilizing an E-mode back-gated MOS structure could serve as a highly efficient and energy-saving approach for the development of gallium oxide (Ga2O3) PDs in solar-blind UV applications.
engineering, electrical & electronic,instruments & instrumentation,physics, applied
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