Demonstration of a 2 Kv Al 0.85 Ga 0.15 N Schottky Barrier Diode with Improved On-Current and Ideality Factor

Yanni Zhang,Jincheng Zhang,Zhihong Liu,Shengrui Xu,Kai Chen,Jing Ning,Chunfu Zhang,Lei Zhang,Peijun Ma,Hong Zhou,Yue Hao
DOI: https://doi.org/10.1109/led.2020.2967895
IF: 4.8157
2020-01-01
IEEE Electron Device Letters
Abstract:In this letter, we report on demonstrating a Schottky barrier diode (SBD) with high reverse blocking voltage by incorporating an ultra-wide bandgap semiconductor Al-0.85 Ga-0.15 N channel. Benefited from the lower activation energy of the Si in GaN, the net carrier concentration of Al-0.85 Ga0.15N can be essentially enhanced to 2 x 10(17) cm(-3) level with surface roughness of 0.33 nm. Due to the good material property, a reverse blocking voltage of 2 kV and room temperature ideality factor of 2.3 are demonstrated. Combined with the significantly improved on-current and on/off ratio of more than 10(6) when compared with other AlN SBDs, Al-0.85 Ga-0.15 N turns out to be a competitive AlN counterpart by considering the compromise among ultra-wide bandgap, dopant activation, and material property.
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