Abstract:Two-dimensional (2D) InSe-based field effect transistor (FET) has shown remarkable carrier mobility and high on-off ratio in experimental reports. Theoretical investigations also predicated the high performance can be well preserved at sub-10 nm nodes in the ballistic limit. However, both experimental experience and theoretical calculations pointed out achieving high-quality ohmic has become the main limiting factor for high-performance 2D FET. In this work, we proposed a new sandwiched ohmic contact with indium for InSe FET and comprehensively evaluated its performance from views of material and device based on ab initio methods. The material properties denote that all of fundamental issues of ohmic contact including tunneling barrier, the Schottky barrier, and effective doping are well concerned by introducing the sandwiched structure, and excellent contact resistance was achieved. At device performance level, devices with gate length of 7, 5, and 3 nm were investigated. All metrics of sandwiched contacted devices far exceed requirement of the International Technology Roadmap for Semiconductors (ITRS) and exhibit obvious promotion as compared to conventional structures. Maximum boost of current with 69.4%, 50%, and 49% are achieved for devices with 7, 5, and 3 nm gate length, respectively. Meanwhile, maximum reduction of the intrinsic delay with 20.4%, 16.7%, and 18.9% are attained. Moreover, a benchmark of energy-delay product (EDP) against other 2D FETs is presented. All InSe FETs with sandwiched ohmic contact surpass MoS2 FETs as well as requirement from ITRS 2024. The best result approaches the upper limit of ideal BP FET, denoting superior preponderance of sandwiched structures for InSe FETs in the next generation of complementary metal-oxide semiconductor (CMOS) technology.

Planar Direction‐Dependent Interfacial Properties in Monolayer In2Se3–Metal Contacts

N-Type Ohmic Contact and P-Type Schottky Contact of Monolayer InSe Transistors

Unusual Fermi‐Level Pinning and Ohmic Contact at Monolayer Bi2O2Se–Metal Interface

Computational Study of Ohmic Contact at Bilayer InSe-Metal Interfaces: Implications for Field-Effect Transistors

Mechanistic Understanding of the Interfacial Properties of Metal-PtSe2 Contacts

Ohmic contact in monolayer InSe-metal interface

Anisotropic interfacial properties of monolayer GeSe—metal contacts

Van der Waals stacking of multilayer In2Se3 with 2D metals induces transition from Schottky to Ohmic contact

Energy Barrier at Indium/Indium Selenide Nanosheet Interfaces: Implications of Metal-to-Insulator Transition for Field-Effect Transistor Modeling

Interfacial Properties of Monolayer MoSe2–Metal Contacts

Gate-tunable interfacial properties of in-plane ML MX2 1T0-2H heterojunctions

External-strain Induced Transition from Schottky to Ohmic Contact in Graphene/InS and Graphene/Janus In2SSe Heterostructures

Alleviation of Schottky barrier heights at TMDs/metal interfaces with a tunneling layer of semiconducting InSe nanoflake

Revealing the Weak Fermi Level Pinning Effect of 2D Semiconductor/2d Metal Contact: A Case of Monolayer In2Ge2Te6 and Its Janus Structure In2Ge2Te3Se3

First-principles study of phase transition in the α-In2Se3/metal heterostructures

High-Performance Two-Dimensional InSe Field-Effect Transistors with Novel Sandwiched Ohmic Contact for Sub-10 nm Nodes: a Theoretical Study

Isotropic Contact Properties in Monolayer GeAs Field-Effect Transistors

Interfacial Properties Of Monolayer Sns-Metal Contacts

Many-Body Effect and Device Performance Limit of Monolayer InSe.

Pervasive Ohmic Contacts in Bilayer Bi2O2Se–Metal Interfaces

The Interfacial Properties of Monolayer MX–Metal Contacts