Magnesium ion-implantation-based gallium nitride p-i-n photodiode for visible-blind ultraviolet detection

Weizong Xu,Yating Shi,Fangfang Ren,Dong Zhou,Linlin Su,Qing Liu,Liang Cheng,Jiandong Ye,Dunjun Chen,Rong Zhang,Youdou Zheng,Hai Lu
DOI: https://doi.org/10.1364/PRJ.7.000B48
IF: 7.6
2019-01-01
Photonics Research
Abstract:In this work, a GaN p-i-n diode based on Mg ion implantation for visible-blind UV detection is demonstrated. With an optimized implantation and annealing process, a p-GaN layer and corresponding GaN p-i-n photodiode are achieved via Mg implantation. As revealed in the UV detection characterizations, these diodes exhibit a sharp wavelength cutoff at 365 nm, high UV/visible rejection ratio of 1.2 x 10(4), and high photoresponsivity of 0.35 A/W, and are proved to be comparable with commercially available GaN p-n photodiodes. Additionally, a localized states-related gain mechanism is systematically investigated, and a relevant physics model of electric-field-assisted photocarrier hopping is proposed. The demonstrated Mg ion-implantation-based approach is believed to be an applicable and CMOS-process-compatible technology for GaN-based p-i-n photodiodes. (C) 2019 Chinese Laser Press
What problem does this paper attempt to address?