Enhanced thermal stability of the metal/dielectric multilayer solar selective absorber by an atomic-layer-deposited Al2O3 barrier layer

Ying Wu,Er-Tao Hu,Qing-Yuan Cai,Jing Wang,Zheng-Yong Wang,Hua-Tian Tu,Ke-Han Yu,Liang-Yao Chen,Wei Wei
DOI: https://doi.org/10.1016/j.apsusc.2020.148678
IF: 6.7
2021-03-01
Applied Surface Science
Abstract:<p>To improve the thermal stability of multilayered solar selective absorber, an atomic-layer-deposited (ALD) Al<sub>2</sub>O<sub>3</sub> layer was adopted to suppress the diffusion of metal atoms from the bottom reflection layer. The designed film structure was as that: Cu (&gt;100.0 nm)/Al<sub>2</sub>O<sub>3</sub> (59.8 nm)/Cr (17.8 nm)/SiO<sub>2</sub> (66.3 nm)/Cr (4.4 nm)/SiO<sub>2</sub> (83.0 nm). Multi-target magnetron sputtering method was employed to fabricate Cu, SiO<sub>2,</sub> and Cr layers, while for the Al<sub>2</sub>O<sub>3</sub> layer, it was prepared by ALD. The sample has a solar absorptance of about 95.4% and a thermal emittance of 0.196 at the temperature of 773 K. The sample with the Al<sub>2</sub>O<sub>3</sub> barrier layer work stably at 500 °C for 72 hours, demonstrating that the proposed multilayer solar selective absorber is suitable for applications at middle-temperature solar thermal conversion systems.</p>
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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