Simultaneous scanning near-field optical and X-ray diffraction microscopy for correlative nanoscale structure-property characterization.

Qian Li,Samuel D. Marks,Sunil Bean,Michael Fisher,Donald A. Walko,Anthony D. DiChiara,Xinzhong Chen,Keiichiro Imura,Noriaki K. Sato,Mengkun Liu,Paul G. Evans,Haidan Wen
DOI: https://doi.org/10.1107/S1600577519008609
IF: 2.557
2019-01-01
Journal of Synchrotron Radiation
Abstract:A multimodal imaging instrument has been developed that integrates scanning near-field optical microscopy with nanofocused synchrotron X-ray diffraction imaging. The instrument allows for the simultaneous nanoscale characterization of electronic/near-field optical properties of materials together with their crystallographic structure, facilitating the investigation of local structure-property relationships. The design, implementation and operating procedures of this instrument are reported. The scientific capabilities are demonstrated in a proof-of-principle study of the insulator-metal phase transition in samarium sulfide (SmS) single crystals induced by applying mechanical pressure via a scanning tip. The multimodal imaging of an in situ tip-written region shows that the near-field optical reflectivity can be correlated with the heterogeneously transformed structure of the near-surface region of the crystal.
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