Influence of Silicon Wall Thickness on the Performance of Structured CsI(Tl) Scintillation Screen Based on Oxidized Silicon Micropore Array Template in X-ray Imaging.

Hui Chen,Mu Gu,Zhixiang Sun,Xiaolin Liu,Bo Liu,Juannan Zhang,Shiming Huang,Chen Ni
DOI: https://doi.org/10.1364/oe.27.014871
IF: 3.8
2019-01-01
Optics Express
Abstract:The influence of silicon wall thickness on the performance of structured CsI(Tl) scintillation screen based on oxidized silicon micropore array template in X-ray imaging was simulated using Geant4 Monte Carlo simulation code in terms of light output (LO), modulation transfer function (MTF) and detective quantum efficiency (DQE). The results show that when the thickness of the silicon wall is less than 0.5 μm, the increase in the bottom light output (BLO) of the screen and the decrease in the spatial resolution of the X-ray imaging system using the screen become more significant as the thickness decreases. At low spatial frequency, the thicker the silicon wall, the lower the DQE. However, the DQE with a thick silicon wall can exceed the DQE with a thin silicon wall at high spatial frequency. All the results provide the quantitative relation between the silicon wall thickness of the structured CsI(Tl) scintillation screen and the quality of the X-ray imaging.
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