Fabrication and Performance of Micron Thick CsI(Tl) Films for X-Ray Imaging Application

Lina Guo,Shuang Liu,Dejun Chen,Shangjian Zhang,Yong Liu,Zhiyong Zhong,Charles M. Falco
DOI: https://doi.org/10.1109/tns.2016.2567444
IF: 1.703
2016-01-01
IEEE Transactions on Nuclear Science
Abstract:CsI(Tl) scintillator films with columnar structure are widely applied as the conversion screens for the indirect X-ray imaging. In this work, CsI(Tl) films with different micron thickness were fabricated on glass substrates by the thermal deposition method under the same deposition conditions. The influence of film thickness on the microstructure and crystalline property of the films was studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The photoluminescent spectra of the films were measured, which appeared by the bimodal distribution peaking at 550 nm and 740 nm respectively. The radioluminescence and imaging performances were observed by the micron thick films coupled with CCD camera system under X-ray exposure conditions.
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