Simultaneous Optimization of Transmittance and Resistivity for Γ-Cui Thin Films Via an Iodination Method at Mild Reaction Condition

Fangjuan Geng,Lei Yang,Bing Dai,Shuai Guo,Gang Gao,Liangge Xu,Jiecai Han,Andrey Bolshakov,Jiaqi Zhu
DOI: https://doi.org/10.1016/j.surfcoat.2018.12.019
2019-01-01
Abstract:In p-type gamma-CuI thin films synthesized by the iodination of Cu layers with iodine vapor, a frosted-glass-like appearance with a rough surface is usually obtained, which makes it difficult to apply the gamma-CuI films to transparent electronics. This paper proposes an innovative method for the preparation of highly transparent p-type gamma-CuI films. A chemical reaction between Cu thin films and iodine vapor, combined with the layer-by-layer process at a temperature between room temperature and 120 degrees C are found to result in highly transparent polycrystalline gamma-CuI films. The root-mean-square roughness values of the gamma-CuI films prepared by this method are 8.5-21.2 nm, which are smaller than those for the gamma-CuI films synthesized by the conventional method. The microstructure and optoelectronic properties of the gamma-CuI thin films are sensitive to the temperature of iodine vapor. A high transmittance (80%) of the film obtained at an iodine vapor temperature of 80 degrees C has a low resistivity of 5 x 10(-2) Omega cm and high mobility of 8.7 cm(2)/Vs. Moreover, a boosted figure of merit is realized due to the simultaneously low resistivity and high transparency: its value jumps from similar to 488 to similar to 1630 M Omega(-1).
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