A SUPPLEMENTARY STUDY ON SURFACE ACIDITY AND SURFACE STRUCTURE OF ZINC OXIDE-SILICON OXIDE

Zhao Biying,Wang Xiuhua,Wu Nianzu,Gui Linlin,Xie Youchang,Tang Youqi
DOI: https://doi.org/10.3866/pku.whxb19880424
1988-01-01
Acta Physico-Chimica Sinica
Abstract:In this paper, the structure of ZnO-SiO2 prepared by precipitation method has been studied by XRD, XPS and surface acidity measurement. The results show that ZnO is dispersed on the surface of SiO2 as a monolayer and has its utmost dispersion capacity (threshold) for this series of samples as well as for the reported ZnO/SiO2[1] which were prepared by impregnation. And there are some stronger surface bonding between ZnO and SiO2 for these two series of samples.In the light of this view, the trend of change of the density of surface acidic sites and the results of XRD for ZnO-SiO2 reported by Sumiyoshi, Tanabe et al([2]) can be also interpreted satisfactorily.In addition, authors proposed some comments on "the model structure of binary oxides" in the light of bond valence theory.
What problem does this paper attempt to address?