Mechanism and Structure Analysis of Tio2 Surface Coated with Sio2 and Al2o3

AL Cui,TJ Wang,Y Jin,SG Xiao,XD Ge
DOI: https://doi.org/10.3321/j.issn:0251-0790.1998.11.030
1998-01-01
Abstract:Photochemical activity of TiO2 can be reduced through surface coating, which favors to increase dispersiveness, weather resistance and antipulverization. The binary coating process of Si and Al to TiO2 was studied experimentally. The isoelectic point of TiO2 in seriflux was measured as pH was equal to 3.6. Maximum Zeta potential can be got at pH 10 around, which favors to dispersion of particles. Studies on the aggregation rate of Si and Al indicate that, when pH has a value between 9 and 10, the aggregation rate of silicon acid is small, which favors to form homogeneous and compact membrane, so optimal coating pH value is between 9 and 10. According to the difference of 2p orbital electron binding energy of Ti in XPS before and after being coated, it can be inferred that Si and Al in coating layer combine to TiO2 surface through chemical bond.
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