Optoelectronic Devices on AlGaN/GaN HEMT Platform (phys. Status Solidi A 5∕2016)

Baikui Li,Xi Tang,Jiannong Wang,Kevin J. Chen
DOI: https://doi.org/10.1002/pssa.201670629
2016-01-01
Abstract:III-nitride optoelectronic and electronic devices have been essentially developed using different epi-structures, i.e., ‘vertical’ pn junction and ‘lateral’ p-doping-free heterojunction, respectively. Integration of the photonic and electronic functionalities of III-nitride semiconductors is of technological interest but has been challenged by the incompatibility of optimized epi-growth conditions and by the complexity of integrated devices with different active layers. Baikui Li et al. (pp. 1213–1221) have achieved electroluminescence (EL) including the GaN band-edge emission at 3.4 eV from Ni/Au- AlGaN/GaN p-doping-free Schottky-on-heterojunction diodes with forward biases higher than 2 V. Based on the surface states distribution of AlGaN, a hot-electron-induced surface states impact ionization model was proposed to explain the hole generation and EL process in the p-doping-free Schottkyon- heterojunction light-emitting diodes (SoH-LEDs). This SoH-LED can be seamlessly integrated into the AlGaN/GaN power high electron mobility transistors (HEMTs) platform as a unique on-chip photon source. By integrating the SoH-LED structure into the drain terminal of a HEMT, a transistor with photonicohmic drain (PODFET) is implemented. In PODFET, photon generation is inherently switched ON/OFF in synchronization with the channel current. The dynamic performances of the PODFET are significantly enhanced owing to photon pumping of deep electron traps.
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