Comparison of WKB Method and Transfer Matrix Method Used in Silicon Field Emission

张祖兴,桑明煌,詹黎,叶志清,聂义友
DOI: https://doi.org/10.3969/j.issn.1000-5862.2004.01.016
2004-01-01
Abstract:Due to band bending of semiconductor surface applied electric field, the electron emission on silicon surface can be considered as a tunneling process through a potential well. In the article, we calculate the quantum energy levels and emission current,respectively using WKB method and the transfer matrix method .By Comparing the conclusion from WKB method and transfer matrix method, we find that the result from transfer matrix is closer to that from FN theory than WKB method. This method may be useful in the analysis on basic physical qualities and parameters of quantum well, such as the characteristics and the quantization effect of an electron in the complicated potential.
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