Interfacial Reactions in the Cu/Ga/Co and Cu/Ga/Ni Samples

Sinn-wen Chen,Ji-min Lin,Tsu-ching Yang,Yi-huei Du
DOI: https://doi.org/10.1007/s11664-019-07121-w
IF: 2.1
2019-01-01
Journal of Electronic Materials
Abstract:To fundamentally understand the solid–liquid interdiffusion joining processes between a Cu electrode and Co and Ni barrier layers using a Ga solder, the interfacial reactions in the Cu/Ga, Co/Ga, Ni/Ga, Cu/Ga/Co and Cu/Ga/Ni samples have been systematically examined. The reaction phases at the Cu/Ga interface in the Cu/Ga, Cu/Ga/Co and Cu/Ga/Ni samples reacted at 200°C, 350°C and 500°C are all the same, and are γ3-Cu9Ga4 and CuGa2, γ2-Cu9Ga4 and γ1-Cu9Ga4 respectively. No Co/Ga interfacial reaction phase was found in either the Co/Ga or Cu/Ga/Co samples reacted at 200°C, and the reaction phase is CoGa3 when reacted at 350°C and 500°C. The reaction phase in the Ni/Ga couples reacted at 200°C and 350°C is the Ni3Ga7 phase while it is Ni2Ga3 at 500°C. In the Cu/Ga/Ni samples, no Ni/Ga interfacial reaction phase is observed at 200°C, and the Ni3Ga7 and Ni2Ga3 phases formed at 350°C and 500°C have 8.5 at.%Cu and 14.0 at.%Cu solubilities. The growth rates of the reaction phases have been determined, and the Ga consumption rates in the Cu/Ga/Co and Cu/Ga/Ni samples at 200°C, 350°C and 500°C were calculated. It is observed that the consumption rates increase with the square root of the reaction time, and the consumption rate constants are 39.2 μm/h0.5 and 77.3 μm/h0.5, respectively.
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