Abstract:Optical microscopy is non-invasive, sample-friendly, and fast, rendering itself the major approach for human beings to explore the microcosmic world. However, the diffraction limit has hindered the resolution of all optical imaging systems to approximately half the wavelength of visible light for over a century, until it was fundamentally broken by the development of super-resolution optical fluorescence microscopy. This technology bridges the gap between the electron microscopes (1 nm) and the ordinary optical microscopes (200 nm to 250 nm), but it is essentially useless for most samples, especially those non-fluorescent-labeled. In recent years, inspired by the synthetic aperture imaging, we have developed the optical super-resolution imaging based on frequency shift, providing a new approach to optical super-resolution imaging. As the technique is not limited by the nonlinear effects of fluorescence, it is applicable for both non-fluorescent-labeled and fluorescent-labeled samples. Besides, due to such advantages as fast imaging, high sample universality, and low phototoxicity, the technique shows good prospects in multiple fields, including materials science, biology, and medicine. In this paper, we deliver a detailed overview on both the principles and methods of optical super-resolution imaging based on frequency shift, as well as our prospects to the future development direction of this technique.

Principles of Optical Super-Resolution Mask in Optical Storage

Optical Super-Resolution Imaging Based On Frequency Shift

Model of Photochromic Mask Layer for Optical Storage

Experimental research on super-resolution digital holography

Laser Direct Writing System and Its Lithography Properties

The Application of Photochromic Diarylethene Mask Layer in the Near-Field Optical Storage

Super-Resolution Near-Field Phase Change Disk with Sb70Te30 Mask Layer

Super-Resolution Recording by an Organic Photochromic Mask Layer

Super-resolution read-only optical disk with different mask materials

The Application of Super-Rens Mask in High-Density Mastering

Optical Properties of Super-Resolution Near-Field Structure for Optical Nano-Storage

Photochromic digital data storage technology

Investigation on Super-Resolution Near-Field Blu-Ray-Type Phase-Change Optical Disk with Sb<sub>2</sub>Te<sub>3</sub> Mask Layer

Model of Multi-Level Optical Storage with Photochromic Materials and Experiments

Photochromic 3D Optical Storage: Laser‐Induced Regulation of Localized Optical Basicity of Glass

A New Structure of Super-Resolution Near-Field Phase-Change Optical Disk with a Sb<sub>2</sub>Te<sub>3</sub>Mask Layer

A New Structure of Super-Resolution Near-Field Phase-Change Optical Disk with a Sb2Te3 Mask Layer

New Structures of the Super-Resolution Near-Field Phase-Change Optical Disk and a New Mask-Layer Material

Super-Resolution Near-Field Optical Disk With An Additional Localized Surface Plasmon Coupling Layer

Design of diffractive superresolution elements for optical data storage

Multi-wavelength and Multi-Level Optical Storage Based on Photochromic Materials