Abstract:ZnO thin films were deposited on a glass substrate by dc (direct current) and rf (radio frequency) magnetron sputtering. Post-deposition annealing was performed in different atmospheres and at different temperatures. The correlation of the annealing conditions with the microstructure and properties of the ZnO films wer e investigated by ultraviolet-visible spectroscopy, X-ray diffraction, conductiv ity measurement and scanning electron microscopy. Only the strong 002 peak could be observed by X-ray diffraction. The post-deposition annealing of ZnO films wa s found to alter the film's microstructure and properties, including crystallini ty, porosity, grain size, internal stress level and resistivity. It was also fou nd that after annealing, the conductivity of poorly conductive samples often imp roved. However, annealing does not improve the conductivity of samples with high conductivity prior to annealing. The resistivity of as-grown films can be decre ased from 102 to 10-4Ω·cm after annealing in nitrogen. To explain the effects of annealing on the conductivity of ZnO, it is believed that annealing may alter the presence and distribution of oxygen defects, reduce the lattice stress, cau se diffusion, grain coarsening and recrystallization. Annealing will reduce the density of grain boundaries in less dense films, which may decrease the resistiv ity of the films. On the other hand, annealing may also increase the porosity of thin films, leading to an increase in resistivity.

Fabrication and Characterization of Amorphous Nb-Zn-Sn-O Thin Films

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Characterization Of Amorphous Si-Zn-Sn-O Thin Films And Applications In Thin-Film Transistors

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Structural and Optoelectrical Properties of Nb-TiO2 Films Fabricated by Low-Energy Magnetron Sputtering and Post-Annealing

Fabrication And Characteristics Of Zno-Based Thin Film Transistors

Influence of Annealing Atmosphere on Microstructure and Optical Properties of ZnO Thin Films

High Performance Rf Sputtering Deposited Zno Thin-Film Transistors

Combustion-Solution Processed Amorphous ZnTiSnO Thin Films and Performances as Thin-Film Transistors

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Growth and Characterization of Polycrystalline NbO2 Thin Films on Crystalline and Amorphous Substrates

Annealing Effect on Properties of Zno Thin Films Grown on LiNbO3 Substrates by MOCVD

MICROSTRUCTURE AND PROPERTIES OF ANNEALED ZnO THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING