Abstract:Silica glass ingot synthesis by flame hydrolysis deposition (FHD) is an important approach to obtain high-purity synthetic silica glass with high refractive index homogeneity. Using the precursor of silicon tetrachloride (SiCI4), the silica ingot (SiO2) can be synthesized in the oxy-hydrogen diffusion flame through a set of kinetic reactions and subsequent cooling. The homogeneity of the synthetic silica glass is influenced by the temperature/diameter equality of silica droplets and the residue of radicals (e.g. OH) in the synthetic silica. In this study, the mixing system of oxy-hydrogen diffusion flame and silica droplets in a furnace were modeled by a Euler-Lagrange multi-phase model, where the interphase exchange of mass, momentum and energy between the gas phase molecules and liquid phase silica droplets during the formation and transportation of silica droplets were included. The silica droplets were tracked by a Lagrangian formulation that includes the discrete phase inertia, hydrodynamic drag, the force of gravity and the dispersion due to turbulent eddies. The molecular gas phase reactions are described by a simple kinetic mechanism involving the major species during the formation of molecular SiO2, with kinetic and thermodynamic parameters taken from the literature when available.The effect of initial equivalence ratio on the flame structure was analyzed in the study, where the high-temperature region is uniform over the glass ingot and the residue is limited at unity equivalence ratio. The probability distributions of silica droplet diameter and temperature were analyzed by employing a developed droplet growth model, where the condensation rate is controlled by the in situ SiO2 vapor concentration and the local flow-condition-determined mass transfer rate. The maximum diameter of silica droplets in the furnace is 1.39 x 10(-4) m, and the percentage of silica droplets decreases with the increasing of diameter. Two high probability regions were observed for the droplet temperature distribution, the temperature below 1500 K accounts for 40% of the total droplet number, and the temperature range between 3500 and 4500 K accounts for 58%. The droplet diameter on the ingot cap distributes in the range from 4 x 10(-5) to 9 x 10-5 m with approximately probability of 85%. The distribution of droplet temperature on the ingot cap is much uniform, with more than half (67%) of the droplets has the temperature between 3100 and 3200 K. (C) 2014 Elsevier Ltd. All rights reserved.

Effects of Precursors on Silica Particle Generation in CVD Synthesis for Fused Silica Glass

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Effects of Gas Flow Rates on Fused Silica Glass

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Preparation and Photoluminescence of Nanocrystalline Si-Rich Silicon Oxide Films by Pecvd

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Thermodynamics on formation of condensed phases during CVD Si 3N 4 process with Sicl 4-NH 3-H 2 precursors