Light-induced Negative Differential Resistance in Gate-Controlled Graphene-Silicon Photodiode

Wei Liu,Hongwei Guo,Wei Li,Xia Wan,Srikrishna Chanakya Bodepudi,Khurram Shehzad,Yang Xu
DOI: https://doi.org/10.1063/1.5026382
IF: 4
2018-01-01
Applied Physics Letters
Abstract:In this letter, we investigated light-induced negative differential resistance (L-NDR) effects in a hybrid photodiode formed by a graphene-silicon (GS) junction and a neighboring graphene-oxide-Si (GOS) capacitor. We observed two distinct L-NDR effects originating from the gate-dependent surface recombination and the potential-well-induced confinement of photo-carriers in the GOS region. We verified this by studying the gate-controlled GS diode, which can distinguish the photocurrent from the GS region with that from the GOS region (gate). A large peak-to-valley ratio of up to 12.1 has been obtained for the L-NDR due to gate-dependent surface recombination. Such strong L-NDR effect provides an opportunity to further engineer the optoelectronic properties of GS junctions along with exploring its potential applications in photodetectors, photo-memories, and position sensitive devices.
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