Abstract:Despite the continued scaling down of semiconductor manufacturing, traditional lithography-based nanofabrication only produces thin film structures, not 3-D shapes. 3-D nanofabrication remains a major challenge, especially for semiconductor materials. Most 3-D nanofabrication techniques, such as two-photon printing and stereolithography, mostly work for polymer materials, not solid-state semiconductor materials. Here, a method capable of fabricating sophisticated 3-D nanostructures of silicon based on the subsurface swelling phenomenon using focused helium ion swelling is reported. Silicon nanosphere arrays, hierarchical nanospheres mimicking compound lenses, nano-Taichi symbols, three-layer nanotowers, and nanopumpkins have been demonstrated, which are challenging for existing nanofabrication technology. The produced silicon nanostructures exhibit super small surface roughness as small as 0.1 nm, two orders of magnitude better than existing 3-D nanofabrication technologies normally above 10 nm. The super small surface roughness opens doors for many exciting applications in photonics, indicating small photon losses. Moreover, it is demonstrated ultraprecise fine-tuning of critical dimensions of ready-made nanostructures or nanodevices, such as tuning the tilting angle of the tip on the atomic force microscopy probe and reducing the nanogap between two metal electrodes from 200 to 4 nm, which is promising for improving nanodevice performances by tuning the critical dimensions to desired ranges.

Large-scale Fabrication of Free-Standing and Transparent SiC Nanohole Array with Tailored Structures

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

The fabrication of large-scale sub-10-nm core-shell silicon nanowire arrays

Large-area silica nanotubes with controllable geometry on silicon substrates

OS1503 Development of Highly Ordered Silicon Nanowire Array

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Preparation, superior field emission properties and first principles calculation of electronic structure of SiC nanowire arrays on Si substrate

Design and fabrication of wafer-scale highly uniform silicon nanowire arrays by metal-assisted chemical etching for antireflection films

Large-area zinc oxide nanorod arrays templated by nanoimprint lithography: control of morphologies and optical properties

Composite Silicon Nanostructure Arrays Fabricated on Optical Fibre by Chemical Etching of Multicrystal Silicon Film.

Femtosecond Laser Nanostructuring on a 4H-Sic Surface by Tailoring the Induced Self-Assembled Nanogratings

Fabrication of Silicon Nanowire Arrays with Controlled Diameter, Length, and Density

Terrace-confined guided growth of high-density ultrathin silicon nanowire array for large area electronics

Nanoscale Opening Fabrication on Si (111) Surface from Sio2 Barrier for Vertical Growth of Iii-V Nanowire Arrays

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

Top-Down Fabrication of Shape Controllable Si Nanowires Based on Conventional Cmos Process

Catalyst-free synthesis of sub-5 nm silicon nanowire arrays with massive lattice contraction and wide bandgap

Controlled Growth of Metal-Free Vertically Aligned CNT Arrays on SiC Surfaces

Fabricating 3D Si nanostructure via a novel Ga+ implantation enabled maskless dry etching process

3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation

Large-scale and highly ordered 1D nanostructural arrays by template-assisted electrodeposition