Abstract:We propose the fabrication of two types high performance texturized antireflective structures on crystalline (100) silicon (c-Si) surface by hybrid picosecond laser scanning irradiation followed by chemical corrosion. The design and the fabrication with high controllable performance were studied. The hybrid method includes 1064 nm picosecond (ps) laser scanning to form micro-hole array and subsequently short-time alkaline corrosion. After ps laser processing, there is little reconsolidation and heat affect zone on the silicon surface, which is beneficial to achieve the precise chemical corrosion effect. Depending on the laser scanning intervals, scanning times and chemical corrosion time, a variety of surface texture morphologies, even a special micro-nano hierarchical structure in which finer nano-structures formed in the micro units of the texture, were achieved. Observing with SEM, the average diameter of the micro-holes in the micro-nano hierarchica is 25~30 μm, while the average size of the nano-level ladder-like structures on the micro-hole wall is from dozens to hundreds of nanometers. Comparing to the traditional laser texturing techniques for c-Si solar cell, the whole laser processing was carried out in an open air ambient without using etch mask and SF6/O2 plasma. The results show the reflectance value of the fabricated c-Si surfaces can reach as low as 6% (400 nm~1000 nm). This is a potential method for economical antireflective structures fabrication which is ideal for using in the high-efficiency silicon-based photoelectronic devices.

Electrochemical Fabrication of Silicon-Based Micro-Nano-Hybrid Porous Arrays for Hybrid-Lattice Photonic Crystal

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Fabrication of Porous Silicon-Based Silicon-on-insulator Photonic Crystal by Electrochemical Etching Method

Electrochemical Formation of Self-positioned Nano-Sized Pores on Oxidized Porous Silicon Substrate

Nano-photonic Crystal Formation on Highly-Doped N-Type Silicon

Fabrication of Silicon Nanopore Arrays Using A Combination of Dry and Wet Etching

Controllable Two-Dimensional Photonic Crystal Patterns Fabricated by Nanosphere Lithography

Deep reactive ion etching of cylindrical nanopores in silicon for photonic crystals

Electrochemically Etched Pore Array in Silicon with Large Spacing and High-Aspect-ratio

Facile Fabrication of Sponge-Like Porous Micropillar Arrays Via an Electrochemical Process.

High Performance Light Trapping Structures for Si-Based Photoelectronics Fabricated by Hybrid Picosecond Laser Irradiation and Chemical Corrosion

5 × 5 cm² silicon photonic crystal slabs on glass and plastic foil exhibiting broadband absorption and high-intensity near-fields

Fabrication of Two-Dimensional Photonic Crystals on N-Type Silicon Substrate Using Holographic and Wet Etching Techniques

Fabrication of Silicon-Based Two-Dimensional Photonic Crystals

Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

Fabrication Of Inverted-Pyramid Silicon Nanopore Arrays With Three-Step Wet Etching

The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint

Method for Fabricating Micro/Nanostructures Via Scanning Probe Microscope and Anisotropic Wet Etching

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Hydrophobic Light-Trapping Structures Fabricated on Silicon Surfaces by Picosecond Laser Texturing and Chemical Etching

Hierarchical Nanostructuring of Porous Silicon with Electrochemical and Regenerative Electroless Etching