Abstract:Mg doped (Pb0.35Sr0.65)TiO3 (PST) thin films were fabricated on indium tin oxide /glass substrates by the sol–gel technique. The formation of the PST phase and control of the magnesium doping on the microstructure, defect states, and dielectric properties of the thin film were investigated by means of XRD, SEM, AFM, XPS, and impedance analysis. Results showed that the oxygen vacancies and the associated Ti3+ ions formed as VO•• ∼ TiTi′ dipole pairs, and the dipole pairs were aligned opposite to the direction of the intrinsic dipole moments in the PST thin film. The amount of dipole pairs was strongly affected by the formed MgTi″ in the thin film. The minimum amount of the dipole pairs appeared in the PST thin film with Mg doping content of 6% in molar ratio. The thin film with Mg doping content of 6% showed high permittivity due to low offset from VO•• ∼ TiTi′ dipole pairs and low dielectric loss due to low defect electrons generated in the thin film simultaneously. The formed MgTi″ in the oxygen octahedral contributed lower response of the dipole moments to external electric field and resulted in lower tunability of the PST thin film with increasing Mg doping content. Controlled by the substitution of Mg2+ ions for Ti4+ ions and the induced VO•• ∼ TiTi′ dipole pairs, the optimal figure of merit was obtained in the PST thin film with Mg doping content of 6% with which the thin film possessed the smallest dielectric loss and still high tunability simultaneously.

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