Dual-Gate Phototransistor with Perovskite Quantum Dots-Pmma Photosensing Nanocomposite Insulator

Xiang Liu,Zhi Tao,Wenjian Kuang,Qianqian Huang,Qing Li,Jing Chen,Wei Lei
DOI: https://doi.org/10.1109/led.2017.2724562
IF: 4.8157
2017-01-01
IEEE Electron Device Letters
Abstract:Dual-gate InGaZnO thin-film-transistors were fabricated to demonstrate their feasibility as phototransistors by fully exploiting the perovskite quantum dots (QDs) with superior quantum yield. Here, we show that by coupling the top-gate photo sensing polymethyl methacrylate (PMMA)/CsPbBr3 QDs hybrid insulator with the classic SiO2 bottom-gate insulator, the phototransistor can exhibit a combination of excellent detective performance (3.75 x 10(12) Jones detectivity and 1 x 10(3)A/W responsivity) and electrical performance (small 3-V threshold voltage, 0.53-V/decade substhreshold slop, and 0.1-V hysteretic threshold voltage's shift). Additionally, this dual-gate phototransistor exhibits high stability and accelerated detecting speed (<100 mu s) due to the inorganic perovskite QDs/PMMA hybrid gate insulator. Our results suggest that in a proper device architecture, perovskite nanomaterials can be promising candidates for cost-effective, high-performance phototransistor.
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