Large Magnetoresistance of Amorphous Carbon Films

Awais Siddique Saleemi,Rajan Singh,Wen Sun,Zhaochu Luo,Xiaozhong Zhang
DOI: https://doi.org/10.1016/j.carbon.2017.06.048
IF: 10.9
2017-01-01
Carbon
Abstract:Magnetoresistance (MR) of pure amorphous carbon thin films deposited by pulsed laser deposition at various deposition temperatures was studied. Maximum MR of 46% was observed at 2 K under the magnetic field of 7 T for the sample deposited at temperature of 500 degrees C. No tendency of MR saturation was observed up to 7 T. The MR decreases rapidly with the increase in measurement temperature and vanishes after 40 K. The transport mechanism of all the samples follow Efros-Shklovskii variable range hopping model. The characteristics temperature decreasing from 2540 K to 1290 K and localization length increasing from 5.3 nm to 10.7 nm with increasing fraction of C(sp(2)) from 72% to 84%. The lower disorder degree may results in higher MR. (C) 2017 Published by Elsevier Ltd.
What problem does this paper attempt to address?