Abstract:Ion-beam irradiation of an amorphizable material such as Si or Ge may lead to spontaneous pattern formation, rather than flat surfaces, for irradiation beyond some critical angle against the surface normal. It is observed experimentally that this critical angle varies according to many factors, including beam energy, ion species and target material. In this first part of a set of papers, we consider a composite model of stress-free strain and isotropic swelling with a generalized treatment of stress modification along idealized ion tracks. We obtain a highly-general linear stability result with a careful treatment of arbitrary depth-dependence profiles for each of the stress-free strain-rate tensor, a source of deviatoric stress modification, and isotropic swelling, a source of isotropic stress. We compare our theoretical results with experimental measurements of angle-dependent deviatoric and isotropic stresses for 250eV Ar+ on Si. Our analysis suggests that the presence of angle-independent isotropic stress and the relationship between the amorphous-crystalline and free interfaces may be strong contributors to critical angle selection, while the influence of inhomogeneous stress modification is seemingly non-existent in the idealized case of diagonally-translated interface and stress generated entirely along a thin, down-beam ion track. We also consider an opposing idealization: that of interfaces defined by vertical translation, with stress modification along the vertical regardless of beam orientation. The unacceptable variability in predictions resulting from these two idealizations, both of which have appeared in recent analyses, prompts modeling refinements discussed in subsequent papers in this set. These refinements include the relationship between interfaces and a more sophisticated treatment of the inhomogeneous stress field.

Measurement of Heavy Ion Irradiation Induced In-Plane Strain in Patterned Face-Centered-Cubic Metal Films: An in Situ Study

Research on Deforming Mechanism of Nanocrystalline Cu Thin Film under Contact Deformation

Nanoscale lattice strains in self-ion implanted tungsten

Modelling Nano-Indentation of Ion-Irradiated FCC Single Crystals by Strain-Gradient Crystal Plasticity Theory

Kinetics and Energetics of Room-Temperature Microstructure in Nanocrystalline Cu Films: the Grain-Size Dependent Intragrain Strain Energy

In situ study on heavy ion irradiation induced microstructure evolution in single crystal Cu with nanovoids at elevated temperature

Unique Irradiation Damage Behavior and Deformation Mechanisms in Crystalline/amorphous Ag/Cu-Zr Nanolaminates

Theoretical Studies on Internal Strain of Face-Centered-cubic Metal Nanoparticles

Size-dependent He-irradiated Tolerance and Plastic Deformation of Crystalline/amorphous Cu/Cu–Zr Nanolaminates

Coherent X-ray measurements of ion-implantation-induced lattice strains in nano-crystals

Characterising Ion-Irradiated FeCr: Hardness, Thermal Diffusivity and Lattice Strain

Observations of Fractal Patterns Induced in Thin Solid Films by Ion Irradiation.

Nanoindentation Test of Ion-Irradiated Materials: Issues, Modeling and Challenges

In situ microstructural evolution in face-centered and body-centered cubic complex concentrated solid-solution alloys under heavy ion irradiation

Characterization of High Energy Xe Ion Irradiation Effects in Single Crystal Molybdenum with Depth-Resolved Synchrotron Microbeam Diffraction

Prediction of irradiation induced microstructures using a multiscale method coupling atomistic and phase field modeling: Application to the AgCu model alloy

In Situ Study of Heavy Ion Irradiation Response of Immiscible Cu/Fe Multilayers

In Situ Microstructural Evolution in Fcc and Bcc Complex Concentrated Solid-Solution Alloys Under Heavy Ion Irradiation

Atomic-scale observation of strain-induced local amorphization in face-centered cubic metals

Unraveling irradiation induced grain growth with in situ transmission electron microscopy and coordinated modeling

Physical mechanisms affecting critical angle for nanopatterning in irradiated thin films: I. A composite model