Thermal Conductivity Measurement of the He-ion Implanted Layer of W Using Transient Thermoreflectance Technique

Shilian Qu,Yuanfei Li,Zhigang Wang,Yuzhen Jia,Chun Li,Ben Xu,Wanqi Chen,Suyuan Bai,Zhengxing Huang,Zhenan Tang,Wei Liu
DOI: https://doi.org/10.1016/j.jnucmat.2016.11.029
IF: 3.555
2017-01-01
Journal of Nuclear Materials
Abstract:Transient thermoreflectance method was applied on the thermal conductivity measurement of the surface damaged layer of He-implanted tungsten. Uniform damages tungsten surface layer was produced by multi-energy He-ion implantation with thickness of 450 nm. Result shows that the thermal conductivity is reduced by 90%. This technique was further applied on sample with holes on the surface, which was produced by the He-implanted at 2953 K. The thermal conductivity decreases to 3% from the bulk value. (C) 2016 Elsevier B.V. All rights reserved.
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