Influence of Deposition Substrate Temperature on the Morphology and Molecular Orientation of Chloroaluminum Phthalocyanine Films As Well the Performance of Organic Photovoltaic Cells

Yan-Qiong Zheng,Jing Zhang,Fang Yang,Takeshi Komino,Bin Wei,Jianhua Zhang,Zixing Wang,Wenhong Pu,Changzhu Yang,Chihaya Adachi

DOI: https://doi.org/10.1088/0957-4484/26/40/405202

IF: 3.5

2015-01-01

Nanotechnology

Abstract:The dependence of the morphology of neat chloroaluminum phthalocyanine (ClAlPc) films on substrate temperature (T-sub) during deposition is investigated by variable angle spectroscopic ellipsometry (VASE), x-ray diffraction (XRD), and atomic force microscopy (AFM) to obtain detailed information about the molecular orientation, phase separation, and crystallinity. AFM images indicate that both grain size and root mean square (RMS) roughness noticeably increase with T-sub both in neat and blend films. Increasing T-sub from room temperature to 420 K increases the horizontal orientation of the ClAlPc molecules with an increase of the mean molecular tilt angle from 60.13 degrees (300 K) to 65.86 degrees (420 K). The UV-vis absorption band of the corresponding films increases and the peak wavelength slightly red shifts with the T-sub increase. XRD patterns show a clear diffraction peak at T-sub over 390 K, implying the p-stacking of interconnected ClAlPc molecules at high T-sub. Planar and bulk heterojunction (BHJ) photovoltaic cells containing pristine ClAlPc films and ClAlPc: C-60 blend films fabricated at T-sub of 390 K show increases in the power conversion efficiency (eta(PCE)) of 28% (eta(PCE) = 3.12%) and 36% (eta(PCE) = 3.58%), respectively, relative to devices as-deposited at room temperature. The maximum short circuit current in BHJs is obtained at 390 K in the T-sub range from 300 K to 450 K.