Abstract:Traditional TiN coatings cannot meet the requirements in many applications under extreme conditions because of their relatively low hardness (similar to2000Hv), high friction coefficient (>0.4), inade- quate thermal stability and insufficient corrosion. (Ti,Al)N coatings are a promising alternative to TiN coatings, which have recently been obtained by some groups. However, The deposition of coatings on ceramic substrates prepared by traditional physical vapor deposition was puzzled by low adhesions. In this work, (Ti,Al)N deposition was realized by a new technique namely pulsed high energy density plasma. The ratio of Ti and Al atoms was kept constant at 1:1, since this was known to be the best ratio for (Ti,Al)N synthesis. However, the process allows many other deposition parameters to be varied. In this study, the influences of the discharge voltage between the inner and outer electrode, the distance between the sample and the pulsed plasma gun, and the shot number of the pulsed plasma on coating formation and properties were investigated. Under the optimum deposition conditions, the adhesive strength of (Ti,Al)N coating to Si3N4 ceramic substrate was satisfactory with the critical load up to more than 80 mN. In addition, the coatings were investigated with respect to mechanical and wear behavior, including nanohardness, Young's modulus and cutting performances. The (Ti,Al)N coatings possess resulted very high values of nanohardness and Young's modulus, which are near to 40 GPa and 680 GPa, respectively. Because of the deposition of (Ti,Al)N coatings the wear resistance and edge life of the coated tools were improved dramatically evaluated by the cutting perforinances of the coated tools in turning HT250 (HB230) steel under industrial conditions. These improvements were attributed to a combination of four effects of deposition, ion implantation, quench and solid solution strengthening in terms of the structural analyses.

Study on the Preparation of Multicomponent Superhard Filmswith PVD Method at Low Temperature

Study on the Phase Composition of Multicomponent Superhard Coatings Prepared by PVD at Low Temperature

An Outline of the Fabrication of Ceramic Film by Low Temperature Deposition from Aqueous Solution

Preparation of FeAl Coating on P110 Steel at Low Temperature

Effect of Low-Energy Ion Irradiation on Synthesis of Hard and Superhard Films

State-of-the-Art Developments in Advanced Hard Ceramic Coatings Using PVD Techniques for High-Temperature Tribological Applications

STUDY OF THE PREPARATION OF HIGH Tc SUPERCONDUCTING YBCO THIN FILMS BY A PLASMA-ASSISTED MOCVD PROCESS

Research on Ultrathin High Temperature Structure Materials Achieved by EB-PVD

Preparation of Conducting Films with High Performance

Review of Mechanical Performance of Superhard Nano-Multilayer Films

Study on composition, microstructure and hardness of DLC films by vcad

Characterization of Superhard Ternary (ti,al)n Coatings Prepared by Pulsed High Energy Density Plasma

609 Low-temperature Synthesis of Superhard Nanocomposite Thin Films

Combining Magnetic Filtered Cathodic Arc Deposition with Ion Beam Sputtering to Afford Superhard TiSiN Multilayer Composite Films with Tunable Microstructure and Mechanical Properties

Thermal Conductive Coatings by PVD Technology

Effect of depositing parameters on microstructures and properties of multi arc ion plating ZrTiN films

Enhanced Formation of Α-Al2o3 at Low Temperature on Cr/Al Coating by Controlling Oxygen Partial Pressure

Research on Preparation Processes of Low-Temperature Poly-Silicon Films

An investigation into low-temperature HFCVD and derivative techniques for the enhancement of diamond-coated cemented carbide tool performance

Study and Development of a Multilayered Coating to Improve Hard Metal Cutting Tools Performances

Microstructure, high-temperature corrosion and steam oxidation properties of Cr/CrN multilayer coatings prepared by magnetron sputtering