TEM STUDY OF MICROSTRUCTURAL CHANGES INDUCED BY AR ION IMPLANTATION IN YBa2Cu3O7-x SUPERCONDUCTING FILMS

LI YI-JIE,XIONG GUANG-CHENG,GAN ZI-ZHAO,REN CONG-XIN,ZOU SHI-CHANG
DOI: https://doi.org/10.7498/aps.42.482
1993-01-01
Abstract:Ar ion implantation induced superconductivity change and structural change in YBa2Cu3O7-x epitaxial films have been studied. After implantation, not only Jc and Tc of the sa-mples decreased with the increasing of Ar ion fluence, but also a metal-to-semiconducfor transition occurred. The TEM photographs showed that the lattice frame of the implanted sa-mples was nearly unchanged under low fluence. Only at high fluence, the structure was comple-tely destroyed. According to the experimental results, we suggest that the degradation of Jc and Tc may mainly result from the disordering of oxygen sublattice.
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