Ab initio study of carrier mobility of few-layer InSe

Chong Sun,Hui Xiang,Bo Xu,Yidong Xia,Jiang Yin,Zhiguo Liu
DOI: https://doi.org/10.7567/APEX.9.035203
IF: 2.819
2016-01-01
Applied Physics Express
Abstract:On the basis of the density functional theory coupled with the Boltzmann transport equation with relaxation time approximation, we investigate the electronic structure and predict the electron mobility of few-layer InSe. Few-layer InSe has a tunable band gap on thickness. At the same time, it possesses a high carrier mobility on the order of 10(3) cm(2)V(-1)s(-1). As we demonstrated, few-layer InSe has potential applications for next-generation electronic materials owing to its considerable band gap and high carrier mobility. (C) 2016 The Japan Society of Applied Physics
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