Chemical-Vapor-Deposited Graphene As Charge Storage Layer in Flash Memory Device

W. J. Liu,L. Chen,P. Zhou,Q. Q. Sun,H. L. Lu,S. J. Ding,David W. Zhang
DOI: https://doi.org/10.1155/2016/6751497
IF: 3.791
2016-01-01
Journal of Nanomaterials
Abstract:We demonstrated a flash memory device with chemical-vapor-deposited graphene as a charge trapping layer. It was found that the average RMS roughness of block oxide on graphene storage layer can be significantly reduced from 5.9 nm to 0.5 nm by inserting a seed metal layer, which was verified by AFM measurements. The memory window is 5.6 V for a dual sweep of ±12 V at room temperature. Moreover, a reduced hysteresis at the low temperature was observed, indicative of water molecules or −OH groups between graphene and dielectric playing an important role in memory windows.
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