Fast and Large-Area Fabrication of Plasmonic Reflection Color Filters by Achromatic Talbot Lithography

Qingjun Wu,Huijuan Xia,Hao Jia,Hao Wang,Cheng Jiang,Liansheng Wang,Jun Zhao,Renzhong Tai,Sanshui Xiao,Dongxian Zhang,Shumin Yang,Jianzhong Jiang
DOI: https://doi.org/10.1364/ol.44.001031
IF: 3.6
2019-01-01
Optics Letters
Abstract:To overcome the limits of traditional technologies, which cannot achieve high resolution and high throughput simultaneously, here we propose, to the best of our knowledge, a novel method, i.e., achromatic Talbot lithography, to fabricate large-area nanopatterns fast and precisely. We successfully demonstrate reflection color filters with a maximum size of about 0.72×0.72  mm2 with a time of only 20 s that have colors similar to simulations and small-area devices fabricated by electron beam lithography. These results indicate the possibility of large-scale fabrication of plasmonic color filters with high resolution efficiently by the achromatic Talbot lithography method.
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