Combined Electric Field and Near-Field Scanning Optical Microscopy: Modification of Silicon Surfaces

M. Tang,Y. Chen,J. Wang,M. Ouyang,S.M. Cai,Z.F. Liu,B.H. Loo
DOI: https://doi.org/10.1007/s003390050874
1999-01-01
Applied Physics A
Abstract:A combined electric field and near-field scanning optical microscope (EF-NSOM) system has been developed for imaging and modifying surfaces. With a negative bias applied to the conducting scaling probe with respect to the substrate, the EF-NSOM system is used to modify nearly atomically flat n-type oxide-passivated Si(111) surfaces. The electric-field-induced modification of Si surfaces, similar to that effected by a scanning tunneling microscope or an atomic force microscope, is observed by the near-field scanning optical microscopy as well as by shear-force microscopy.
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