Thickness-controlled Direct Growth of Nanographene and Nanographite Film on Non-Catalytic Substrates

Lei Du,Liu Yang,Zhiting Hu,Jiazhen Zhang,Chunlai Huang,Liaoxin Sun,Lin Wang,Dacheng Wei,Gang Chen,Wei Lu
DOI: https://doi.org/10.1088/1361-6528/aab4c1
IF: 3.5
2018-01-01
Nanotechnology
Abstract:Metal-catalyzed chemical vapor deposition (CVD) has been broadly employed for large-scale production of high-quality graphene. However, a following transfer process to targeted substrates is needed, which is incompatible with current silicon technology. We here report a new CVD approach to form nanographene and nanographite films with accurate thickness control directly on non-catalytic substrates such as silicon dioxide and quartz at 800 °C. The growth time is as short as a few seconds. The approach includes using 9-bis(diethylamino)silylanthracene as the carbon source and an atomic layer deposition (ALD) controlling system. The structure of the formed nanographene and nanographite films were characterized using atomic force microscopy, high resolution transmission electron microscopy, Raman scattering, and x-ray photoemission spectroscopy. The nanographite film exhibits a transmittance higher than 80% at 550 nm and a sheet electrical resistance of 2000 ohms per square at room temperature. A negative temperature-dependence of the resistance of the nanographite film is also observed. Moreover, the thickness of the films can be precisely controlled via the deposition cycles using an ALD system, which promotes great application potential for optoelectronic and thermoelectronic-devices.
What problem does this paper attempt to address?