Abstract:The patterning of semiconductors with complex 3D hierarchical structures having sub-100 nm resolution is propelling a new generation of optical metasurfaces for applications in optoelectronic interconnects and hyperspectral imaging. These complex structures are now manufacturable with the advent of Metal-assisted chemical imprinting (Mac-Imprint). This technique involves bringing a 3D patterned catalytic stamp into contact with a semiconductor substrate in the presence of an etching solution. Recently, a novel class of catalytic stamps made of Au-coated porous polymeric membranes was developed in order to allow for etching solution storage and mass-transport of the reactants, all of which are essential for fast and accurate Mac-Imprint. Further, the flexibility and stretchability of these porous membranes allows for the use of pressure-based actuation to bring both planar and non-planar substrates in conformal contact with the stamp, replicating the set-up of modern nanoimprinting lithography equipment. Due to the contact-based nature of the Mac-Imprint process, it is vital to understand the mechanical behavior of the stamp. Thus, this work attempts to computationally elucidate the mechanical behavior of the stamp during conformal Mac- Imprint. In particular, the elastic behavior of a stamps laminate made of commercial porous polyvinylidene fluoride (PVDF) with nominal pore sizes of 100 nm and solid polyimide (PI) is modelled using finite element analysis (FEA) in a commercial ANSYS software with material constants, extracted via uniaxial tensile test. The FEA prediction using 2D axisymmetric model is able to capture the induced biaxial stress, strain, deflection and yield of the porous PVDF. To validate simulation results, a deflection test was experimentally performed as a function of air pressure and the obtained results matched with the FEA simulation.

Molecular Dynamics Calculation of Resist Deformation Behavior in Nanoimprint

Coarse-Grain Simulations of the Polymer Filling Process in Nanolithography

Molecular dynamics simulation study of the degradation of polymer nanopatterns created by nanoimprint

Molecular Dynamics Investigation of the Deformation Mechanism of Gold with Variations in Mold Profiles during Nanoimprinting

Hydrodynamics and solid mechanics structural analysis of mold deformation in nanoimprint lithography

Hydrodynamic and Solid Mechanics Analysis of Capillary Force-Induced Mold Deformation in Sub-10 nm UV Nanoimprint Lithography

Molecular Dynamics Simulation of Form Measurement Process of Soft Materials Using Atomic Force Microscope

Effects of Mold Geometries and Initial Resist Thickness on Filling Behavior in UV-Nanoimprint Lithography

An Accurate Thermomechanical Model for Laser-Driven Microtransfer Printing

Deformation Mechanism of Aluminum, Copper, and Gold in Nanoimprint Lithography Using Molecular Dynamics Simulation

Resist deformation and flow fields in microimprint lithography

Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns

The Role of Stress in Nanoimprint Lithography

Influence of Molecular Weight and Processing Conditions on the Thermal Stability of Nanoimprinted Polymer Structures

Optimization of Control Parameters in Micro Hot Embossing

Investigation of Resist Filling Behavior in Microimprint Lithography by Computational Fluid Dynamics Simulation and Defocusing Digital Particle Image Velocimetry

A Sandwiched Flexible Polymer Mold for Control of Particle-Induced Defects in Nanoimprint Lithography

Numerical Investigation for the Resin Filling Behavior during Ultraviolet Nanoimprint Lithography of Subwavelength Moth-Eye Nanostructure

Burger Model as the Best Option for Modeling of Viscoelastic Behavior of Resists for Nanoimprint Lithography

Understanding mechanical response of porous polymeric stamps during large-area metal-assisted chemical imprinting of silicon

Nanoimprint lithography technology