Continuous Ultra-Thin Carbon Nitride Thin Film for Magnetic Hard Disk Via Post Nitrogen Plasma Treatment

Wah Lawrence Ng,Amalina Balqis binti Abu Bakar,Mohammad Azrul Firdhaus bin Azmi,Khoo Wee Shen,Yonggang Meng
DOI: https://doi.org/10.1007/s00542-016-2909-0
2016-01-01
Microsystem Technologies
Abstract:Diamond like carbon thin films of rigid magnetic hard disks were post treated with nitrogen plasma via hot filament plasma enhanced chemical vapor deposition method. These rigid magnetic hard disks were able to function effectively as a protective barrier for moisture percolation and bonding sites for the lubricant thin film. This technique allows practitioner to control moisture percolation to the magnetic thin film by limiting nitrogenation to the topmost surface of the carbon film with no noticeable change to roughness. The corrosion resistance of the magnetic hard disk carbon thin film with different nitrogen percentage were characterized with conducting AFM and cobalt extraction method. The corrosion resistance become worst with increasing nitrogen content. The lubricant affinity of the carbon thin films as well as structural properties with different nitrogen content were characterized. Lubricant affinity becomes higher with increasing nitrogen content similar to those deposited by mixing hydrocarbon gas with nitrogen gas. This technique is most useful when the carbon thin films needs to be extremely thin (<2 nm), and continuous carbon nitride film is require.
What problem does this paper attempt to address?