Experimental Observation on a Temperature-Induced Decoupling Between the Surface States in Topological Insulator Nanoplates Bi2−0.15(TeSe)3+0.15

Haoran Lu,Kang Zhang,Haiyang Pan,Junwen Zeng,Taishi Chen,Fengqi Song,Xuefeng Wang,Feng Miao,Rong Zhang
DOI: https://doi.org/10.1007/s00339-016-9888-y
2016-01-01
Abstract:We report on the temperature-induced quantum decoupling between the surface states, demonstrated by weak antilocalization measurements, in the topological insulator Bi2−0.15(TeSe)3+0.15 nanoplates. The samples are prepared by a catalyst-free vapor–solid process with the dimension of 10 μm and the thickness of 20 nm. The channel indicator is extracted from the weak antilocalization, which presents a transition from 0.5 to 1 with the increasing temperature. This reveals the coherent decoupling between the two surface states, during which the dephasing length reaches the plate thickness. A bulk-mediated intersurface coupling model interprets the transition.
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